Preparation of Highly Oriented Aluminum Nitride Thin Films...

Journal of the American Ceramic Society 2001 Vol. 84; Iss. 9

Preparation of Highly Oriented Aluminum Nitride Thin Films on Polycrystalline Substrates by Helicon Plasma Sputtering and Annealing

Morito Akiyama, Chao-Nan Xu, Masaya Kodama, Ichiro Usui, Kazuhiro Nonaka, Tadahiko Watanabe
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Volume:
84
Year:
2001
Language:
english
Pages:
4
DOI:
10.1111/j.1151-2916.2001.tb00937.x
File:
PDF, 174 KB
english, 2001
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