Anomalous Temperature Dependence of the Growth Rate of the Reaction Layer between Silica and Molten Aluminum
Noboru Yoshikawa, Atsushi Kikuchi, Shoji TaniguchiVolume:
85
Year:
2002
Language:
english
Pages:
8
DOI:
10.1111/j.1151-2916.2002.tb00360.x
File:
PDF, 859 KB
english, 2002