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Transmission electron microscopy study of erbium silicide formation from Ti/Er stack for Schottky contact applications
J. RATAJCZAK, A. ŁASZCZ, A. CZERWINSKI, J. KĄTCKI, F. PHILLIPP, P.A. VAN AKEN, N. RECKINGER, E. DUBOISVolume:
237
Year:
2010
Language:
english
Pages:
5
DOI:
10.1111/j.1365-2818.2009.03264.x
File:
PDF, 372 KB
english, 2010