ChemInform Abstract: LPCVD of Silicon Nitride from...

ChemInform 2001 Vol. 32; Iss. 30

ChemInform Abstract: LPCVD of Silicon Nitride from Dichlorosilane and Ammonia by Single Wafer Rapid Thermal Processing.

Dana Teasdale, Yoshihide Senzaki, Robert Herring, Gary Hoeye, Lawrence Page, Phillip Schubert
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Volume:
32
Year:
2001
Pages:
1
DOI:
10.1002/chin.200130237
File:
PDF, 34 KB
2001
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