Characterization of single crystal silicon and...

Characterization of single crystal silicon and electroplated nickel films by uniaxial tensile test with in situ X-ray diffraction measurement

T. NAMAZU, S. INOUE
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Volume:
30
Year:
2007
Language:
english
Pages:
8
DOI:
10.1111/j.1460-2695.2006.01043.x
File:
PDF, 2.42 MB
english, 2007
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