Combinatorial Chemical Vapor Deposition. Achieving Compositional Spreads of Titanium, Tin, and Hafnium Oxides by Balancing Reactor Fluid Dynamics and Depositions Kinetics.
Ryan C. Smith, Noel Hoilien, Jimmy Chien, Stephen A. Campbell, Jeffrey T. Roberts, Wayne L. GladfelterVolume:
34
Year:
2003
Pages:
1
DOI:
10.1002/chin.200312215
File:
PDF, 68 KB
2003