Diffusion paths in a high-tech environment: clusters and...

R&D Management 1992 Vol. 22; Iss. 1

Diffusion paths in a high-tech environment: clusters and commonalities

Christopher J. Easingwood, Simon O. Lunn
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Volume:
22
Year:
1992
Language:
english
Pages:
12
DOI:
10.1111/j.1467-9310.1992.tb00789.x
File:
PDF, 736 KB
english, 1992
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