Microstructural Development of the AlN/Ti Diffusion Couple...

Microstructural Development of the AlN/Ti Diffusion Couple Annealed at 1000°C

Chia-Hsiang Chiu, Chien-Cheng Lin
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Volume:
91
Year:
2008
Language:
english
Pages:
8
DOI:
10.1111/j.1551-2916.2008.02290.x
File:
PDF, 1.25 MB
english, 2008
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