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Processing Technologies for High-Permittivity Thin Films in Capacitor Applications
Geoff L. Brennecka, Jon F. Ihlefeld, Jon-Paul Maria, Bruce A. Tuttle, Paul G. ClemVolume:
93
Year:
2010
Language:
english
Pages:
20
DOI:
10.1111/j.1551-2916.2010.04211.x
File:
PDF, 1.91 MB
english, 2010