![](/img/cover-not-exists.png)
Silicasulfuric Acid/NaNO2 as a New Reagent for Deprotection of S,S-Acetals under Solvent-Free Conditions.
Abdol R. Hajipour, Amin Zarei, Leila Khazdooz, Seied Ali Pourmousavi, Arnold E. RuohoVolume:
36
Year:
2005
Pages:
1
DOI:
10.1002/chin.200540070
File:
PDF, 22 KB
2005