New CVD Precursors Capable of Depositing Copper Metal under...

New CVD Precursors Capable of Depositing Copper Metal under Mixed O2/Ar Atmosphere.

Eddy Lay, Yi-Hwa Song, Yuan-Chieh Chiu, Yang-Miin Lin, Yun Chi, Arthur J. Carty, Shie-Ming Peng, Gene-Hsiang Lee
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Volume:
36
Year:
2005
Pages:
1
DOI:
10.1002/chin.200550212
File:
PDF, 21 KB
2005
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