Volume 27; Issue 5

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Journal of Photopolymer Science and Technology
Volume 27; Issue 5

Journal of Photopolymer Science and Technology

Volume 27; Issue 5

1

Organic Solar Cells Based on Ternary Blend Active Layer of Two Donors PTB7, P3HT and Accepter PC61BM

Ohori, Yurina, Hoashi, Toshihiro, Yanagi, Yuichiro, Okukawa, Takanori, Fujii, Shunjiro, Kataura, Hiromichi, Nishioka, Yasushiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 515 KB

english, 2014

2

Exploring Photovoltaic Feasibility of Pentaaryl [60]Fullerene in Bulk Heterojunction Architecture

Mikie, Tsubasa, Saeki, Akinori, Ikuma, Naohiko, Kokubo, Ken, Seki, Shu

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 519 KB

english, 2014

3

Organic Solar Cells Based on PTB7:PC71BM with Cs2CO3 as a Cathode Buffer Layer

Kaneto, Daichi, Yanagidate, Tatsuki, Yanagi, Yuichiro, Fujii, Shunjiro, Kataura, Hiromichi, Nishioka, Yasushiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 363 KB

english, 2014

4

Cathode Interface Investigation In Polymer/Fullerene Based Organic Solar Cells

Liao, Ying-Jie, Yuan, Da-Xing, Xu, Mei-Feng, Jin, Zhi-Ming, Wang, Zhao-Kui, Liao, Liao-Sheng

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 347 KB

english, 2014

5

EUV Research Activity at SEMATECH

Neisser, Mark, Jen, Shih-Hui, Chun, Jun Sung, Antohe, Alin, He, Long, Kearney, Patrick, Goodwin, Frank

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 1.06 MB

english, 2014

6

Progresses and Challenges of EUV Lithography Materials

Simone, Danilo De, Goethals, Anne Marie, Roey, Frieda Van, Zheng, Tao, Foubert, Philippe, Hendrickx, Eric, Vandenberghe, Geert, Ronse, Kurt

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 1.83 MB

english, 2014

7

EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement

Emura, Kazuya, Watanabe, Takeo, Yamaguchi, Masato, Tanino, Hirohito, Fukui, Tsubasa, Shiono, Daiju, Haruyama, Yuichi, Muramatsu, Yasuji, Ohmori, Katsumi, Sato, Kazufumi, Harada, Tetsuo, Kinoshita, Hir

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 636 KB

english, 2014

8

Transparent Conductive Films by Laser Sintering of Metal Nanoparticles

Qin, Gang, Watanabe, Akira

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 325 KB

english, 2014

9

Recent Progress of EUV Resist Technology in EIDEC

Shiobara, Eishi

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 941 KB

english, 2014

10

Electron Penetration Depths in EUV Photoresists

Torok, Justin, Srivats, Bharath, Memon, Shahid, Herbol, Henry, Schad, Jonathan, Das, Sanjana, Ocola, Leonidas, Denbeaux, Greg, Brainard, Robert L.

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 448 KB

english, 2014

11

Inhomogeneity of PAGs in Resist Film studied by Molecular Dynamics Simulations

Toriumi, Minoru, Itani, Toshiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 662 KB

english, 2014

12

Metal Oxide Nanoparticle Photoresists for EUV Patterning

Jiang, Jing, Chakrabarty, Souvik, Yu, Mufei, Ober, Christopher K.

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 687 KB

english, 2014

13

Progress Towards Production Worthy EUV Photoresists: Balancing Litho, Outgassing and OOB Performance

Cameron, James, Thackeray, James, Jain, Vipul, LaBeaume, Paul, Coley, Suzanne, Ongayi, Owendi, Wagner, Mike, Biafore, John

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 1.46 MB

english, 2014

14

Development of Self-Assembling Alternating Amphiphilic Compounds

Muraoka, Takahiro, Sadhukhan, Nabanita, Li, Rui, Kinbara, Kazushi

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 584 KB

english, 2014

15

Spatial Point Analysis of Ion Track Patterns using Common Polymer Films by Atomic Forced Microscopy

Omichi, Masaaki, Choi, Wookjin, Tsukuda, Satoshi, Sugimoto, Masaki, Seki, Shu

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 516 KB

english, 2014

16

A Study of Acid Diffusion Behaviors of PAG by using Top Coat Method for EUVL

Sekiguchi, Atsushi, Watanabe, Takeo, Kinoshita, Hiroo

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 2.15 MB

english, 2014

17

Novel EUV Resists Materials for 16nm HP and beyond

Sakai, Kazunori, Shiratani, Motohiro, Fujisawa, Tomohisa, Inukai, Koji, Sakai, Kaori, Maruyama, Ken, Hoshiko, Kenji, Ayothi, Ramakrishnan, Santos, Andreia, Naruoka, Takehiko, Nagai, Tomoki

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 1.49 MB

english, 2014

18

Novel EUV Resist Materials Design for 14 nm Half Pitch and below

Tarutani, Shinji, Tsubaki, Hideaki, Fujimori, Toru, Takizawa, Hiroo, Goto, Takahiro

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 3.30 MB

english, 2014

19

Bismuth Resists for EUV Lithography

Passarelli, James, Sortland, Miriam, Re, Ryan Del, Cardineau, Brian, Sarma, Chandra, Freedman, Daniel A., Brainard, Robert L.

Journal:

Journal of Photopolymer Science and Technology

Year:

2014

Language:

english

File:

PDF, 1.75 MB

english, 2014