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Volume 45; Issue 1
Main
Microelectronic Engineering
Volume 45; Issue 1
Microelectronic Engineering
Volume 45; Issue 1
1
Nano-lithography by electron exposure using an Atomic Force Microscope
P Davidsson
,
A Lindell
,
T Mäkelä
,
M Paalanen
,
J Pekola
Journal:
Microelectronic Engineering
Year:
1999
Language:
english
File:
PDF, 423 KB
Your tags:
english, 1999
2
Chemically-assisted ion-beam etching of (AlGa)As/GaAs: lattice damage and removal by in-situ Cl2 treatment
J Daleiden
,
R Kiefer
,
S Klußmann
,
M Kunzer
,
C Manz
,
M Wailher
,
J Braunstein
,
G Weimann
Journal:
Microelectronic Engineering
Year:
1999
Language:
english
File:
PDF, 461 KB
Your tags:
english, 1999
3
Process and equipment simulation of copper chemical vapor deposition using Cu(hfac)vtms
H. Wolf
,
J. Röber
,
S. Riedel
,
R. Streiter
,
T. Gessner
Journal:
Microelectronic Engineering
Year:
1999
Language:
english
File:
PDF, 1.01 MB
Your tags:
english, 1999
4
Three-dimensional modeling and evaluation of body tied versus floating body SOI MOSFETs
K Varahramyan
,
S Arshad
,
W.P Maszara
Journal:
Microelectronic Engineering
Year:
1999
Language:
english
File:
PDF, 1.45 MB
Your tags:
english, 1999
5
Low-energy (300 eV) versatile scanning electron microscope with 30 nm resolution
A. Zlatkin
,
N. Garcı́a
Journal:
Microelectronic Engineering
Year:
1999
Language:
english
File:
PDF, 1.02 MB
Your tags:
english, 1999
6
The quality of 200 mm diameter epitaxial Si wafers for advanced CMOS technology monitored using synchrotron X-ray topography
Patrick J. McNally
,
A.N. Danilewsky
,
J.W. Curley
,
A Reader
,
R. Rantamäki
,
T. Tuomi
,
M. Bolt
,
M. Taskinen
Journal:
Microelectronic Engineering
Year:
1999
Language:
english
File:
PDF, 747 KB
Your tags:
english, 1999
7
Hot-carrier-induced abnormal gm degradation in sub-0.1-μm-channel nMOSFETs/SIMOX with LDD structure
Yasuhisa Omura
Journal:
Microelectronic Engineering
Year:
1999
Language:
english
File:
PDF, 771 KB
Your tags:
english, 1999
8
Negative resist profiles of close-spaced parallel and isolated lines: experiment, modelling and simulation
I. Karafyllidis
,
P.I. Hagouel
,
A.R. Neureuther
Journal:
Microelectronic Engineering
Year:
1999
Language:
english
File:
PDF, 1.39 MB
Your tags:
english, 1999
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