Volume 525

MRS Proceedings

Volume 525

1

Advances in Rtp Temperature Measurement and Control

Peuse, Bruce, Miner, Gary, Yam, Mark, Elia, Curtis

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 2.14 MB

english, 1998

2

The Two-Step Rapid Thermal Annealing Effect of the Prepatterned A-SI Films

Park, Kee-Chan, Choi, Kwon-Young, Lee, Min-Cheol, Han, Min-Koo, Yoon, Chan-Eui

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 75 KB

english, 1998

3

Rapid Thermal Processes for Future Nanometer MOS Devices

Hauser, John R.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 645 KB

english, 1998

4

Defect Reduction in Remote Plasma Deposited Silicon Nitride by Post-Deposition Rapid Thermal Annealing

Lucovsky, G., Parker, C. R., Wu, Y., HAUSER, J. R.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 543 KB

english, 1998

5

Difference between Wafer Temperature and Thermocouple Reading during rapid Thermal Processing

Borca-Tasciuc, T., Achimov, D. A., Chen, G.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 351 KB

english, 1998

6

Model Based Temperature Control in RTP Yielding ±0.1 °C accuracy on A 1000 °C, 2 second, 100 °C/s Spike Anneal

Vandenabeele, Peter, Renken, Wayne

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 387 KB

english, 1998

7

Calibration of Wafer Temperature to Nist Traceable Standards Using an Isothermal Cavity

Vandenabeele, Peter, Renken, Wayne

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 961 KB

english, 1998

8

RTP Temperature Measurements Using Si Grating Prepared by Laser Ablation for Large Diameter Wafer Applications

Liu, C. W., Lee, M. H., Chao, C. Y., Chen, C. Y., Yang, C. C., Chang, Y.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 616 KB

english, 1998

9

Meeting RTP Temperature Accuracy Requirements: Measurement and Calibrations at Nist

Lovas, F. J., Tsai, B. K., Gibson, C. E.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.27 MB

english, 1998

10

Laser Ultrasonic Instrumentation for Accurate Temperature Measurement of Silicon Wafers in Rapid Thermal Processing Systems

Klimek, Dan, Anthonyt, Brian, Abbate, Agostino, Kotidis, Petros

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 944 KB

english, 1998

11

Growth And Characterization of Thin Wet Oxides Grown by Rapid Thermal Processing

Sharangpani, R., Das, J., Tay, S. P., Thakur, R. P. S., Yang, T. C., Saraswat, K. C.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 791 KB

english, 1998

12

Partial Transparency Effects of Silicon During Rapid Thermal Processing

Abramson, A. R., Tadal, H., Nieva, P., Zavracky, P., Miaoulis, I. N., Wong, P. Y.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 415 KB

english, 1998

13

Cathodoluminescence Studies of Si-Sio2 Interfaces Prepared by Plasma-Assisted Oxidation and Subjected to Post-Oxidation Rapid Thermal Annealing

Schafer, J., Young, A. P., Brillson, L. J., Niimi, H., Lucovsky, G.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 760 KB

english, 1998

14

Evaluation and Comparison of 3.0 nm Gate-Stack Dielectrics for Tenth-Micron Technology NMOSFETs

Yee, K. F., Osburn, C. M., Masnari, N. A., Hauser, J. R., Parker, C. G., Lucovsky, G., Henson, W. K., Wortman., J. J., Kippenberg, T., Kuerschner, S.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 399 KB

english, 1998

15

Evaluation Of 2.0 nm Grown and Deposited Dielectrics in 0.1 μm PMOSFETs

Srivastava, A., Heinisch, H. H., Vogel, E., Parker, C., Osburn, C. M., Masnari, N. A., Wortman, J. J., Hauser, J. R.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.15 MB

english, 1998

16

Nitrogen Profile Engineering in Thin Gate Oxides

Kuehne, J., Hattangady, S., Piccirillo, J., Xing, G. C., Miner, G., Lopes, D., Tauber, R.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 493 KB

english, 1998

17

Alternative Gate Dielectrics with BST/TIO2/(Barrier Oxide) Stacked Structure

Jeon, Yongjoo, Lee, Byoung Hun, Zawadzki, Keith, Qi, Wen-Jie, Lee, Jack C.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.49 MB

english, 1998

18

An Atomic Force Microscopy and Ellipsometry Study of The Nucleation and Growth Mechanism of Polycrystalline Silicon Films on Silicon Dioxide

Basa, C., Tinani, M., Irene, E. A.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 875 KB

english, 1998

19

A Comparison of Mos Devices with In-Situ Boron Doped Polysilicon and Poly Sige Gates Deposited in an Rtcvd System Using S12H6 and B2H6 Gas Mixture

Mirabedini, M. R., Li, V. Z-Q, Acker, A. R., Kuehn, R. T., Venables, D., Öztürk, M. C., Wortman, J. J.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 269 KB

english, 1998

20

The Effect Of Chamber Components On Wafer Temperature Response In An Rtp System

Acharya, N., Timans, P. J.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 361 KB

english, 1998

21

Polycrystalline Sil-x-yGex.Cy for Suppression of Boron Penetration in PMOS Structures

Chang, C. L., Sturm, J. C.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 336 KB

english, 1998

22

Chemical Stability of Advanced Metal Gate and Ultra-thin Gate Dielectric Interface During Rapid Thermal Annealing

Claflin, B., Binger, M., Lucovsky, G.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 344 KB

english, 1998

23

Characterisation of Low Energy Boron Implantation and Fast Ramp-Up Rapid Thermal Annealing

Collart, E. J. H., de Cock, G., Murrell, A. J., Foad, M. A.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 566 KB

english, 1998

24

Simulation of Rapid Thermal Annealed Boron Ultra-Shallow Junctions in Inert and Oxidizing Ambient

Lerch, W., Glück, M., Stolwijk, N. A., Walk, H., Schäfer, M., Marcus, S. D., Downey, D. F., Chow, J. W., Marquardt, H.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 917 KB

english, 1998

25

Annealing Studies on Low Energy As+ and As2+ Implants

Srinivasa, Raghu, Agarwal, Vikas, Liu, Jinning, Downey, Daniel F., Banerjee, Sanjay

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.52 MB

english, 1998

26

The Effects of Small Concentrations of Oxygen in RTP Annealing of Low Energy Boron, BF2 and Arsenic Ion Implants

Downey, Daniel F., Chow, Judy W., Lerch, Wilfried, Niess, Juergen, Marcus, Steven D.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.64 MB

english, 1998

27

Emissivity Of Coated Silicon At Elevated Temperatures

Rogne, H., Ahmed, H.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 680 KB

english, 1998

28

Novel Applications of Rapid Thermal Chemical Vapor Deposition for Nanoscale MOSFET’s

Sturm, J. C., Yang, M., Chang, C. L., Carroll, M. S.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 810 KB

english, 1998

29

In-Situ Boron-Doped Epitaxial Silicon Films Grown by UHVRTCVD: Applications in Channel Engineering & Ultra-Shallow Junction Formation

Ban, I., Öztürk, M. C., LEE, K. L.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 480 KB

english, 1998

30

Facet Free Selective Silicon Epitaxy by Rapid Thermal Chemical Vapor Deposition

Violette, Katherine E., Wise, Rick, Chao, Chih-Ping, Unnikrishnan, Sreenath

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.62 MB

english, 1998

31

Control and Impact of Processing Ambient During Rapid Thermal Silicidation

Maex, K., Kondoh, E., Lauwers, A., Steegen, A., De Potter, M., Besser, P., Proost, J.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 3.51 MB

english, 1998

32

Comparison of the Performance of Single Wafer and Batch Systems for Identical Processes

Claasen, T., Van Driel, R., Hasper, A., Radelaar, S.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.09 MB

english, 1998

33

New Approaches for Formation of Ultra-Thin PtSi Layers for Infrared Applications

Donaton, R. A., Jin, S., Bender, H., Zagrebnov, M., Baert, K., Maex, K., Vantomme, A., Langouche, G.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 2.79 MB

english, 1998

34

A Novel Low Temperature Self-Aligned Ti Silicide Technology for Sub-0.18 μm Cmos Devices

Ren, L. P., Liu, P., Pan, G. Z., Woo, Jason C. S.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 761 KB

english, 1998

35

Process Design & Integration of Salicide and Source/Drain Process Modules for Improved Device Performance

Apte, Pushkar P., Saxena, Sharad, Rao, Suraj, Vasanth, Karthik, Prinslow, Douglas A., Kittl, Jorge A., Breedijk, Terence, Pollack, Gordon

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.24 MB

english, 1998

36

A Study of Transistor Optimization in A 0.25 Micron Cmos Flow Using Source/Drain and Silicide Process Modules and Their Interactions

Vasanth, K., Apte, P., Davis, J., Saxena, S., Burch, R., Rao, S., Mozumder, P. K.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 383 KB

english, 1998

37

Optimization of Ti and Co Self-Aligned Silicide RTP for 0.10 μm Cmos

Kittl, J. A., Hong, Q. Z., Yang, H., Yu, N., Rodder, M., Apte, P. P., Shiau, W. T., Chao, C. P., Breedijk, T., Pas, M. F.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 2.39 MB

english, 1998

38

Novel Applications of Rapid Photothermal Chemical Vapor Deposition

Singh, R., Parihar, V., Chen, Y., Poole, K. F., DeBoer, S., Thakur, R. P. S., Sharangpani, R., Vasudev, P. K.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.71 MB

english, 1998

39

Iron-Silicate Glassy Films by Sol-Gel Conversion Induced by Rapid Thermal Processing

Van De Leest, René E., Roozeboom, Fred

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.20 MB

english, 1998

40

Selective Oxidation of Si in the Presence of W and Wn

Lin, Boyang, Hwang, Ming, Lu, Jiong-Ping, Hsu, Wei-Yung, Pas, Mike, Piccirillo, Joe, Miner, Gary, OConnor, Kathy, Xing, Gary, Lopes, Dave

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.38 MB

english, 1998

41

In Situ Wafer Cleaning Prior to Selective HemiSpherical Grain (HSG) Poly-Silicon Deposition Using RT-CVD

Brosilow, B. J., Levy, S., Gilboa, Y. E.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.58 MB

english, 1998

42

Improved Thermal Stability of CVD WSi. During Furnace Oxidation by a Rapid Thermal Anneal Pretreatment

Blosse, Alain P.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.93 MB

english, 1998

43

SiGe Heteroepitaxy for High Frequency Circuits

Tillack, B., Bolze, D., Fischer, G., Kissinger, G., Knoll, D., Ritter, G., Schley, P., Wolansky, D.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 650 KB

english, 1998

44

Bandgap Shifting of an Ultra-Thin InGaAs/InP Quantum Well Infrared Photodetector via Rapid Thermal Annealing

Sengupta, D. K., Kim, S., Kuo, H. C., Curtis, A. P., Hsieh, K. C., Bishop, S. G., Feng, M., Stillman, G. E., Gunapala, S. D., Bandara, S. V., Chang, Y. C., Liu, H. C.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 410 KB

english, 1998

45

On the Entrance Effects and the Influence of Buoyancy Forces on the Fluid Flow In Rtp Reactors

Rainova, Yu. P., Antonenko, K. I., Pezoldt, J., Schenk, A.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 2.03 MB

english, 1998

46

Residual Gases and Their Influence on Processes in the Atmospheric Rapid Thermal Processing Equipment

Hu, Yao Zhi, Tay, Sing Pin

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 767 KB

english, 1998

47

In-Line Ambient Impurity Measurement on a Rapid Thermal Process Chamber by Atmospheric Pressure Ionisation Mass Spectrometry

Kondoh, Eiichi, Vereecke, Guy, Heyns, Marc M., Maex, Karen, Gutt, Thomas, Nwnyeil, Zsolt

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 804 KB

english, 1998

48

Beyond Thermal Budget: Using D · t In Kinetic Optimization Of RTP

Ditchfield, R., Seebauer, E. G.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 2.04 MB

english, 1998

49

Development and Characterization of a Cvd System for Thin-Film Solar Cell Manufacturing

Faller, F. R., Hurrle, A., Schillinger, N.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 3.14 MB

english, 1998

50

RTP Calibration Wafer using thin-film Thermocouples

Kreider, K. G., Dewitt, D. P., Tsai, B. K., Lovas, F. J., Allen, D. W.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 1.59 MB

english, 1998

51

Issues in Emissivity of Silicon

Abedrabbo, S., Hensel, J. C., Gokce, O. H., Tong, F. M., Sopori, B., Fiory, A. T., Ravindra, N. M.

Journal:

MRS Proceedings

Year:

1998

Language:

english

File:

PDF, 369 KB

english, 1998

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