Volume 20; Issue 2

Plasma Sources Science and Technology

Volume 20; Issue 2
1

Electrical and plasma parameters of ICP with high coupling efficiency

Godyak, V A
Journal:
Plasma Sources Science and Technology
Year:
2011
Language:
english
File:
PDF, 329 KB
english, 2011
5

Particle simulation methods for studies of low-pressure plasma sources

Donkó, Zoltán
Journal:
Plasma Sources Science and Technology
Year:
2011
Language:
english
File:
PDF, 2.68 MB
english, 2011
17

Kinetic theory of the presheath and the Bohm criterion

Baalrud, S D, Hegna, C C
Journal:
Plasma Sources Science and Technology
Year:
2011
Language:
english
File:
PDF, 1.04 MB
english, 2011
18

ECR plasma photographs as a plasma diagnostic

Rácz, R, Biri, S, Pálinkás, J
Journal:
Plasma Sources Science and Technology
Year:
2011
Language:
english
File:
PDF, 1.07 MB
english, 2011
19

Low-pressure nonequilibrium plasma for a top-down nanoprocess

Makabe, Toshiaki, Yagisawa, Takashi
Journal:
Plasma Sources Science and Technology
Year:
2011
Language:
english
File:
PDF, 921 KB
english, 2011
20

The LC resonance probe for determining local plasma density

Boris, D R, Fernsler, R F, Walton, S G
Journal:
Plasma Sources Science and Technology
Year:
2011
Language:
english
File:
PDF, 1.20 MB
english, 2011
21

The value of swarm data for practical modeling of plasma devices

Napartovich, A P, Kochetov, I V
Journal:
Plasma Sources Science and Technology
Year:
2011
Language:
english
File:
PDF, 1.07 MB
english, 2011