Volume 14; Issue 7

Polymer Engineering & Science

Volume 14; Issue 7
1

Masthead

Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 77 KB
english, 1974
2

Preface

Maung S. Htoo
Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 61 KB
english, 1974
3

Photochemistry in the solid phase

J. E. Guillet
Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 469 KB
english, 1974
4

Photocrosslinkable polyphosphonates having unusual resistance to acids

Douglas G. Borden
Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 369 KB
english, 1974
5

Azide photoresists for projection photolithography

N. J. Clecak, R. J. Cox, W. M. Moreau
Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 261 KB
english, 1974
7

Computer simulation study of images in contact and near-contact printing

B. J. Lin
Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 2.56 MB
english, 1974
8

Flash exposure system for thin photoresist films

D. E. O'Hora, W. F. Beuschel
Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 327 KB
english, 1974
9

Epoxy photopolymers in photoimaging and photofabrication

Sheldon I. Schlesinger
Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 320 KB
english, 1974
10

Electron beam processing systems (a state of the art review)

M. Hatzakis
Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 200 KB
english, 1974
12

Vapor development of poly(olefin sulfone) resists

M. J. Bowden, L. F. Thompson
Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 401 KB
english, 1974
14

Factors affecting the sensitivity of e-beam resists

Terry L. Brewer
Journal:
Polymer Engineering & Science
Year:
1974
Language:
english
File:
PDF, 362 KB
english, 1974