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Volume 32; Issue 21

Polymer Engineering & Science

Volume 32; Issue 21

1

Masthead

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 80 KB

english, 1992

2

Preamble

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 39 KB

english, 1992

3

Progress in deep-UV resists using CARL technology

R. Leuschner, H. Borndörfer, E. Kühn, M. Sebald, R. Sezi, M. Byer, Ch. Nölscher

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 798 KB

english, 1992

4

Effect of post-exposure delay in positive acting chemically amplified resists: An analytical study

O. Nalamasu, E. Reichmanis, J. E. Hanson, R. S. Kanga, L. A. Heimbrook, A. B. Emerson, F. A. Baiocchi, S. Vaidya

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 600 KB

english, 1992

5

A novel chemically amplified positive deep UV photoresist with significantly reduced sensitivity to environmental contamination

Subhankar Chatterjee, Sangya Jain, Ping H. Lu, Dinesh N. Khanna, Robert E. Potvin, James A. McCaulley, Joseph Rafalko

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 637 KB

english, 1992

6

Anti-reflective coating for deep UV lithography process enhancement

Gregg A. Barnes, Tony D. Flaim, Susan K. Jones, Bruce W. Dudley, David A. Koester, Charles R. Peters, Stephen M. Bobbio

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 499 KB

english, 1992

7

Aerial image formation with a KrF excimer laser stepper

M. E. Preil, W. H. Arnold

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 608 KB

english, 1992

8

The thermal deprotection process in an e-beam exposed phenolic-based polymer

Treva Long, S. Kay Obendorf, Ferdinand Rodriguez

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 581 KB

english, 1992

9

Dry-developed organosilicon resists for 193-nm excimer laser lithography

R. R. Kunz, M. W. Horn

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 493 KB

english, 1992

10

Selected equipment, materials, and process interactions in a surface-imaging process

César M. Garza, Eric J. Solowiej, Mark A. Boehm

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 506 KB

english, 1992

11

A photosensitive polyimide using an alkaline aqueous solution as a developer

Hiroshi Nishizawa, Kuniaki Sato, Mitsumasa Kojima, Hidetaka Satou

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 194 KB

english, 1992

12

Synthesis and characterization of a low stress photosensitive polyimide

Allan E. Nader, Kazunori Imai, John D. Craig, Christina N. Lazaridis, Daniel O. Murray III, Michael T. Pottiger, Stephen A. Dombchik, William J. Lautenberger

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 503 KB

english, 1992

13

Ester-type photosensitive polyimide precursor with low thermal expansion coefficient

Y. Matsuoka, K. Yokota, S. Ogitani, A. Ikeda, H. Takahashi, H. Ai

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 377 KB

english, 1992

14

Novel auto-photosensitive polyimides with tailored properties

Ottmar Rohde, Paul Smolka, Pasquale A. Falcigno, Josef Pfeifer

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 623 KB

english, 1992

15

Photosensitive polyimidesiloxanes

J.-O. Choi, J. C. Rosenfeld, J. A. Tyrell, J. H. Yang, S. R. Rojstaczer, S. Jeng

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 272 KB

english, 1992

16

A new positive-type photoreactive polyimide precursor using 1,4-dihydropyridine derivative

Toshihiko Omote, Tsuguo Yamaoka

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 585 KB

english, 1992

17

Intrinsically photosensitive polyimides: Approaches to fluorinated homologs

J. A. Moore, Donald R. Gamble

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 283 KB

english, 1992

18

Pre-imidized photoimageable polyimide as a dielectric for high density multichip modules

Jay M. Cech, Andrew F. Burnett, Lisa Knapp

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 802 KB

english, 1992

19

Direct patterning using metallo-organics and its application to mask repair

Satoshi Takechi, Naomichi Abe

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 409 KB

english, 1992