Volume 263; Issue 1

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Thin Solid Films
Volume 263; Issue 1

Thin Solid Films

Volume 263; Issue 1

1

Cyclic alkylsilanes as low-pressure chemical vapor deposition silicon dioxide precursors

Ravi Kumar Laxman, Arthur K. Hochberg, Hansong Cheng, David A. Roberts

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 486 KB

english, 1995

2

Sb-doped SnO2 transparent conducting oxide from the sol-gel dip-coating technique

C. Terrier, J.P. Chatelon, R. Berjoan, J.A. Roger

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 568 KB

english, 1995

3

The optical band gap of semiconducting iron disilicide thin films

M. Ožvold, V. Boháč, V. Gašparík, G. Leggieri, Š. Luby, A. Luches, E. Majková, P. Mrafko

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 630 KB

english, 1995

4

Picosecond decay of photoinduced absorption in undoped amorphous and polycrystalline silicon thin films

M. Kubinyi, A. Grofcsik, W.J. Jones, T.E. Dyer, J.M. Marshall, A.R. Hepburn

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 564 KB

english, 1995

5

Microstructure and magnetoresistance in Cu-Co alloy thin films

Kazuhiro Yamamoto, Masahiro Kitad

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 595 KB

english, 1995

6

Ellipsometric investigations during titanium deposition in a hollow cathode arc evaporation device

H. Steffen, H. Wulff

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 1023 KB

english, 1995

7

Alternating sputtered Al-Mo deposits and their interaction with a Au top layer

Kwang-Lung Lin, Yu-Jin Ho, Jin-Kuo Ho

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 780 KB

english, 1995

8

The growth of thin Cu films on an O-precovered Ru(0001) surface studied by low energy ion beams

Y.G. Shen, D.J. O'Connor, H. van Zee, K. Wandelt, R.J. MacDonald

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 731 KB

english, 1995

9

Oblique growth of iron thin films on glass: a cross-sectional transmission electron microscopy study

P. Fréchard, S. Andrieu, D. Chateigner, M. Hallouis, P. Germi, M. Pernet

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 572 KB

english, 1995

10

Relations between structural and electronic properties of SnO2 polycrystalline thin films prepared by the aerosol MOCVD technique

A.I. Ivashchenco, E.V. Karyaev, I.V. Khoroshun, G.A. Kiosse, V.T. Moshnyaga, P.A. Petrenco

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 589 KB

english, 1995

11

Preparation and properties of transparent conducting indium tin oxide films deposited by reactive evaporation

H.L. Ma, D.H. Zhang, P. Ma, S.Z. Win, S.Y. Li

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 644 KB

english, 1995

12

Fabrication of titanium oxide thin films by controlled growth with sequential surface chemical reactions

Hiroshi Kumagai, Masahiko Matsumoto, Koichi Toyoda, Minoru Obara, Michio Suzuki

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 710 KB

english, 1995

13

Deposition of manganese-doped zinc sulfide thin films by the successive ionic layer adsorption and reaction (SILAR) method

Seppo Lindroos, Tapio Kanniainen, Markku Leskelä, Eero Rauhala

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 534 KB

english, 1995

14

Initial stages of growth during CVD of W on TiSi2 substrates

J. Engqvist, U. Jansson

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 1.18 MB

english, 1995

15

Directional and preferential sputtering-based physical vapor deposition

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 1.33 MB

english, 1995

16

Effect of gas environment on second harmonic generation of Langmuir-Blodgett films

Xinsheng Zhao, Xiaoming Xie, Xiaohua Xia, Hui Li, Kezhi Wang, Chunhui Huang, Tiankai Li, Lingge Xu

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 245 KB

english, 1995

17

A current measurement technique applied to Langmuir films

H. Hasmonay, A. Hochapfel, G. Dumas, P. Peretti

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 190 KB

english, 1995

18

Chemical vapour deposition of Al2O3 on TiO

Eva Fredriksson, Jan-Otto Carlsson

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 897 KB

english, 1995

19

Gas-phase kinetics for TiO2 CVD: hot-wall reactor results

Qingming Zhang, Gregory L. Griffin

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 795 KB

english, 1995

20

Editorial Board

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 50 KB

english, 1995

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