Volume 390; Issue 1-2

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Thin Solid Films
Volume 390; Issue 1-2

Thin Solid Films

Volume 390; Issue 1-2

1

LiNb1−xTaxO3 films prepared by thermal plasma spray CVD

Hironori Yamamoto, Sergei A. Kulinich, Kazuo Terashima

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 131 KB

english, 2001

2

Rapid hard tooling by plasma spraying for injection molding and sheet metal forming

Haiou Zhang, Guilan Wang, Yunhua Luo, Takeo Nakaga

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 1.08 MB

english, 2001

3

Study on mechanism of C–H radicals’ recombination into acetylene in the process of coal pyrolysis in hydrogen plasma

Mingdong Li, Yousan Fan, Bo Dai, Weiwei Deng, Xiaolei Liu

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 129 KB

english, 2001

4

Three-dimensional simulation of a plasma jet with transverse particle and carrier gas injection

He-Ping Li, Xi Chen

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 176 KB

english, 2001

5

Modeling of the supersonic argon plasma jet at low gas pressure environment

Peng Han, Xi Chen

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 215 KB

english, 2001

6

Numerical analysis and experiments on transferred plasma torches for finding appropriate operating conditions and electrode configuration for a waste melting process

Min Hur, Tae Hyung Hwang, Won Tae Ju, Chan Min Lee, Sang Hee Hong

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 454 KB

english, 2001

7

Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases

R Miyano, T Saito, K Kimura, M Ikeda, H Takikawa, T Sakakibara

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 1.14 MB

english, 2001

8

Optical emission patterns and microwave field distributions in a cylindrical microwave plasma source

Fang Fang, Rongqing Liang, Qiongrong Ou, Yifeng Sui

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 650 KB

english, 2001

9

Production of low electron temperature ECR plasma for plasma processing

Naho Itagaki, Yoko Ueda, Nobuo Ishii, Yoshinobu Kawai

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 174 KB

english, 2001

10

Ion and neutral temperatures in an electron cyclotron resonance plasma

Akira Yonesu, Shunjiro Shinohara, Yasumasa Yamashiro, Yoshinobu Kawai

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 128 KB

english, 2001

11

Synthesis of new ceramics from powder mixtures using thermal plasma processing

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 1.17 MB

english, 2001

12

Preparation of ultrafine particles of silicon base intermetallic compound by arc plasma method

Takayuki Watanabe, Hajime Itoh, Yoshiro Ishii

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 371 KB

english, 2001

13

Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias

P. Tristant, Z. Ding, Q.B. Trang Vinh, H. Hidalgo, J.L. Jauberteau, J. Desmaison, C. Dong

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 227 KB

english, 2001

14

Quantitative modeling of reactive sputtering process for MgO thin film deposition

Y Matsuda, K Otomo, H Fujiyama

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 144 KB

english, 2001

15

Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering

Jun Xu, Xinlu Deng, Jialiang Zhang, Wenqi Lu, Tengcai Ma

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 165 KB

english, 2001

16

Pulsed high energy density plasma processing silicon surface

Bin Liu, Chizi Liu, Dajung Cheng, Rui He, Si-Ze Yang

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 342 KB

english, 2001

17

Oxidative degradation of acridine orange induced by plasma with contact glow discharge electrolysis

Jinzhang Gao, Zhongai Hu, Xiaoyan Wang, Jingguo Hou, Xiaoquan Lu, Jingwan Kang

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 109 KB

english, 2001

18

Stabilization of chlorofluorocarbons (CFCs) by plasma copolymerization with hydrocarbon monomers

Osamu Tsuji, Takeshi Minaguchi, Hirohiko Nakano

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 210 KB

english, 2001

19

A novel pulsed plasma for chemical conversion

Shuiliang Yao, Eiji Suzuki, Akira Nakayama

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 515 KB

english, 2001

20

A study on the formation and characteristics of the SiOCH composite thin films with low dielectric constant for advanced semiconductor devices

Chang Shil Yang, Kyoung Suk Oh, Jai Yon Ryu, Doo Chul Kim, Jing Shou-Yong, Chi Kyu Choi, Heon-Ju Lee, Se Hun Um, Hong Young Chang

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 198 KB

english, 2001

21

Localized material growth by a dielectric barrier discharge

Nan Jiang, Sheng Fa Qian, Long Wang, Hou Xian Zhang

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 529 KB

english, 2001

22

Numerical simulation of coating growth and pore formation in rapid plasma spray tooling

Yanxiang Chen, Guilan Wang, Haiou Zhang

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 1.14 MB

english, 2001

23

Investigation of deposition rate and structure of pulse DC plasma polymers

Jing Zhang, William van Ooij, Paul France, Saswati Datta, Arseni Radomyselskiy, Hanqun Xie

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 138 KB

english, 2001

24

Surface modification of titanium oxide in pulse-modulated induction thermal plasma

Takamasa Ishigaki, Hajime Haneda, Nobuhiro Okada, Shigeru Ito

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 544 KB

english, 2001

25

BCN nanotubes prepared by a plasma evaporation method

Yusuke Moriyoshi, Yoshiki Shimizu, Takayuki Watanabe

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 1012 KB

english, 2001

26

Synthesis of fullerenes from carbon powder by using high power induction thermal plasma

C. Wang, T. Imahori, Y. Tanaka, T. Sakuta, H. Takikawa, H. Matsuo

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 446 KB

english, 2001

27

Characterization of multilayer films of TiAlOCN system prepared by pulsed d.c. plasma-enhanced chemical vapor deposition

Kazuki Kawata, Hiroyuki Sugimura, Osamu Takai

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 291 KB

english, 2001

28

Preparation of strontium titanate thin films by mirror-confinement-type electron cyclotron resonance plasma sputtering

So Baba, Ken Numata, Hidenori Saito, Masao Kumagai, Toshiyuki Ueno, Bunkei Kyoh, Shoji Miyake

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 861 KB

english, 2001

29

Large-area uniform dust-free plasma CVD

Hiroshi Fujiyama, Yoko Maemura, Toru Yamaguchi

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 1.20 MB

english, 2001

30

Anomalous behavior of electron temperature in silane glow discharge plasmas

Madoka Takai, Tomonori Nishimoto, Michio Kondo, Akihisa Matsuda

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 751 KB

english, 2001

31

Reduction of carbon impurities in silicon oxide films prepared by rf plasma-enhanced CVD

Katsuya Teshima, Yasushi Inoue, Hiroyuki Sugimura, Osamu Takai

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 358 KB

english, 2001

32

Dissociation process of CH4/H2 gas mixture during EACVD

Lifang Dong, Junying Chen, Xiaowei Li, Lianshui Zhang, Li Han, Guangsheng Fu

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 139 KB

english, 2001

33

CVD of hard DLC films in a radio frequency inductively coupled plasma source

S.J Yu, Z.F Ding, J Xu, J.L Zhang, T.C Ma

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 271 KB

english, 2001

34

Adhesion improvement of diamond films on cemented carbides with copper implant layer

Ma Zhibin, Wang Jianhua, Wu Qingchong, Wang Chuanxin

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 162 KB

english, 2001

35

Synthesis of multi-walled carbon nanotubes by microwave plasma-enhanced chemical vapor deposition

Xizhang Wang, Zheng Hu, Qiang Wu, Xin Chen, Yi Chen

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 871 KB

english, 2001

36

Surface reaction processes in C4F8 and C5F8 plasmas for selective etching of SiO2 over photo-resist

Hideki Motomura, Shin-ichi Imai, Kunihide Tachibana

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 256 KB

english, 2001

37

Dynamic nitrogen and titanium plasma ion implantation/deposition at different bias voltages

Xiubo Tian, Langping Wang, Qingyu Zhang, Paul K Chu

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 523 KB

english, 2001

38

Steady-state direct-current plasma immersion ion implantation using an electron cyclotron resonance plasma source

Xuchu Zeng, Paul K Chu, Qingchuan Chen, Honghui Tong

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 183 KB

english, 2001

39

Ion-burst method for positive and negative ion species measurements

S Yoshimura, R Ichiki, M Shindo, Y Kawai

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 131 KB

english, 2001

40

Characteristics of VHF excited hydrogen plasmas using a ladder-shaped electrode

Y Takeuchi, I Kawasaki, H Mashima, M Murata, Y Kawai

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 151 KB

english, 2001

41

Estimate of the negative ion density in reactive gas plasmas

M. Shindo, R. Ichiki, S. Yoshimura, Y. Kawai

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 152 KB

english, 2001

42

Low-frequency modes in two-dimensional Debye-Yukawa plasma crystals

Xiaogang Wang, Yue Liu, A. Bhattacharjee, Shuanghui Hu

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 96 KB

english, 2001

43

Multiple microscale plasma CVD apparatuses on a substrate

Tsuyohito Ito, Kazuo Terashima

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 679 KB

english, 2001

44

Dielectric barrier discharge — properties and applications

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 191 KB

english, 2001

45

Study on formation process of surface plasma

G.Q Zhang, Y.J Ge, W.J Yang, Z.F Zhao

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 305 KB

english, 2001

46

Subject Index of Volume 390

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 60 KB

english, 2001

47

Author Index of Volume 390

Journal:

Thin Solid Films

Year:

2001

File:

PDF, 35 KB

2001

48

Preface

K. Tachibana, T. Watanabe, X.-F. Yang

Journal:

Thin Solid Films

Year:

2001

Language:

english

File:

PDF, 36 KB

english, 2001