Volume 14; Issue 3-4

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Chemical Vapor Deposition
Volume 14; Issue 3-4

Chemical Vapor Deposition

Volume 14; Issue 3-4

1

Atomic Layer Deposition of Iron Oxide Thin Films and Nanotubes using Ferrocene and Oxygen as Precursors

Ma˚rten Rooth, Anders Johansson, Kaupo Kukli, Jaan Aarik, Mats Boman, Anders Hårsta

Journal:

Chemical Vapor Deposition

Year:

2008

Language:

english

File:

PDF, 193 KB

english, 2008

2

Bis(tert-butylimido)-bis(dialkylamido) Complexes of Molybdenum as Atomic Layer Deposition (ALD) Precursors for Molybdenum Nitride: the Effect of the Alkyl Group

Ville Miikkulainen, Mika Suvanto, Tapani A. Pakkanen

Journal:

Chemical Vapor Deposition

Year:

2008

Language:

english

File:

PDF, 149 KB

english, 2008

3

Thermodynamic Aspects of Diamond/β-SiC Composite Films

Vadali V. S. S. Srikanth, Vicente Braz Trindade, Thorsten Staedler, Xin Jiang

Journal:

Chemical Vapor Deposition

Year:

2008

Language:

english

File:

PDF, 323 KB

english, 2008

4

Atomic Layer Deposition of LaF3 Thin Films using La(thd)3 and TiF4 as Precursors

Tero Pilvi, Esa Puukilainen, Kai Arstila, Markku Leskelä, Mikko Ritala

Journal:

Chemical Vapor Deposition

Year:

2008

Language:

english

File:

PDF, 247 KB

english, 2008

5

Cover Picture from Haycock and co-workers (Chem. Vap. Deposition 3–4/2008)

Journal:

Chemical Vapor Deposition

Year:

2008

File:

PDF, 164 KB

2008

6

Contents: (Chem. Vap. Deposition 3–4/2008)

Journal:

Chemical Vapor Deposition

Year:

2008

Language:

english

File:

PDF, 48 KB

english, 2008

7

Author Index and Subject Index Chem. Vap. Deposition 3–4/2008

Journal:

Chemical Vapor Deposition

Year:

2008

Language:

english

File:

PDF, 88 KB

english, 2008