Volume 19; Issue 4-6

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Chemical Vapor Deposition
Volume 19; Issue 4-6

Chemical Vapor Deposition

Volume 19; Issue 4-6

1

Photocatalytic Properties of WO 3 /TiO 2 Core/Shell Nanofibers prepared by Electrospinning and Atomic Layer Deposition

Szilágyi, Imre Miklós, Santala, Eero, Heikkilä, Mikko, Pore, Viljami, Kemell, Marianna, Nikitin, Timur, Teucher, Georg, Firkala, Tamás, Khriachtchev, Leonid, Räsänen, Markku, Ritala, Mikko, Leskelä, M

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 642 KB

english, 2013

2

Atomic Layer Deposition of Al-doped ZnO Films Using Aluminum Isopropoxide as the Al Precursor

Qian, Xu, Cao, Yanqiang, Guo, Binglei, Zhai, Haifa, Li, Aidong

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 455 KB

english, 2013

3

Special Issue: Functional Materials by Atomic Layer Deposition

Knez, Mato, Qin, Yong

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 43 KB

english, 2013

4

A Micro-pulse Process of Atomic Layer Deposition of Iron Oxide Using Ferrocene and Ozone Precursors and Ti-Doping

Li, Xianglin, Fan, Ng Chin, Fan, Hong Jin

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 528 KB

english, 2013

5

Al x Ta y O z Mixture Coatings Prepared Using Atomic Layer Deposition for Corrosion Protection of Steel

Härkönen, Emma, Díaz, Belén, Światowska, Jolanta, Maurice, Vincent, Seyeux, Antoine, Fenker, Martin, Tóth, Lajos, Radnóczi, György, Marcus, Philippe, Ritala, Mikko

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 1022 KB

english, 2013

6

Recent Developments of Atomic Layer Deposition Processes for Metallization

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 1.15 MB

english, 2013

7

Atmospheric Pressure Plasma ALD of Titanium Oxide

Theirich, Detlef, Müller, Roman, Zilberberg, Kirill, Trost, Sara, Behrendt, Andreas, Riedl, Thomas

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 595 KB

english, 2013

8

Modeling of Precursors for Atomic Layer Deposition of Magnesium and Calcium Oxide

Kazadojev, Ivan, Otway, David J., Elliott, Simon D.

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 533 KB

english, 2013

9

Cover image from Potts and co-workers (Chem. Vap. Deposition 4-5-6/2013)

Journal:

Chemical Vapor Deposition

Year:

2013

File:

PDF, 116 KB

2013

10

Molecular Layer Deposition of Zircone and ZrO 2 /Zircone Alloy Films: Growth and Properties

Lee, Byoung H., Anderson, Virginia R., George, Steven M.

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 1.04 MB

english, 2013

11

Thin Films of High- k Oxides and ZnO for Transparent Electronic Devices

Gieraltowska, Sylwia, Wachnicki, Lukasz, Witkowski, Bartlomiej S., Guziewicz, Elzbieta, Godlewski, Marek

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 664 KB

english, 2013

12

Influence of Subsurface Hybrid Material Growth on the Mechanical Properties of Atomic Layer Deposited Thin Films on Polymers

Sun, Yujie, Padbury, Richard P., Akyildiz, Halil I., Goertz, Matthew P., Palmer, Jeremy A., Jur, Jesse S.

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 937 KB

english, 2013

13

Atomic Layer Deposition of LiF Thin Films from Lithd and TiF 4 Precursors

Mäntymäki, Miia, Hämäläinen, Jani, Puukilainen, Esa, Munnik, Frans, Ritala, Mikko, Leskelä, Markku

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 519 KB

english, 2013

14

Contents: (Chem. Vap. Deposition 1-2-3/2013)

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 372 KB

english, 2013

15

Masthead: (Chem. Vap. Deposition 4-5-6/2013)

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 40 KB

english, 2013

16

Organic-Inorganic Hybrid Nano-laminates Fabricated by Ozone-assisted Molecular-atomic Layer Deposition

Huang, Jie, Lee, Mingun, Lucero, Antonio, Kim, Jiyoung

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 649 KB

english, 2013

17

Atomic Layer Deposition of W:Al 2 O 3 Nanocomposite Films with Tunable Resistivity

Mane, Anil U., Elam, Jeffrey W.

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 512 KB

english, 2013

18

A Water-free Low Temperature Process for Atomic Layer Deposition of Al 2 O 3 Films

Guo, Jiao-Jiao, Li, Ming-Da, Sun, Qing-Qing, Yang, Wen, Zhou, Peng, Ding, Shi-Jin, Zhang, David Wei

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 372 KB

english, 2013

19

Molecular Hybrid Structures by Atomic Layer Deposition - Deposition of Alq 3 , Znq 2 and Tiq 4 (q = 8-hydroxyquinoline)

Nilsen, Ola, Haug, Kristoffer Robin, Finstad, Terje, Fjellvåg, Helmer

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 529 KB

english, 2013

20

Low-Temperature Atomic Layer Deposition of Tungsten using Tungsten Hexafluoride and Highly-diluted Silane in Argon

Kalanyan, Berç, Losego, Mark D., Oldham, Christopher J., Parsons, Gregory N.

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 493 KB

english, 2013

21

Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD

Potts, Stephen E., Profijt, Harald B., Roelofs, Robin, Kessels, Wilhelmus M. M.

Journal:

Chemical Vapor Deposition

Year:

2013

Language:

english

File:

PDF, 412 KB

english, 2013