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Volume 2; Issue 3
Main
Chemical Vapor Deposition
Volume 2; Issue 3
Chemical Vapor Deposition
Volume 2; Issue 3
1
Masthead
Journal:
Chemical Vapor Deposition
Year:
1996
Language:
english
File:
PDF, 59 KB
Your tags:
english, 1996
2
Metal Chalcogenide Materials: Chalcogenolato complexes as “single-source” precursors
Prof. Manfred Bochmann
Journal:
Chemical Vapor Deposition
Year:
1996
Language:
english
File:
PDF, 1.28 MB
Your tags:
english, 1996
3
Chemical Vapor Deposition Topotaxy in Porous Hosts
Dr. Carol L. Bowes
,
Dr. Andrzej Malek
,
Prof. Geoffrey A. Ozin
Journal:
Chemical Vapor Deposition
Year:
1996
Language:
english
File:
PDF, 2.12 MB
Your tags:
english, 1996
4
Synthesis and characterization of polyether adducts of group 2 metal thioacetates: Single-source precursors to binary metal sulfide films, MS, where M Ca, Sr, Ba
Dr. Klaus Kunze
,
Dr. Laurent Bihry
,
Dr. Paolina Atanasova
,
Prof. Mark J. Hampden-Smith
,
Dr. Eileen N. Duesler
Journal:
Chemical Vapor Deposition
Year:
1996
Language:
english
File:
PDF, 387 KB
Your tags:
english, 1996
5
In situ halide chemical vapor deposition of Bi2Sr2CaCu2O8 + x on silver substrates
Dr. Anders Hårsta
,
Stefan Lundquist
Journal:
Chemical Vapor Deposition
Year:
1996
Language:
english
File:
PDF, 670 KB
Your tags:
english, 1996
6
Trends in precursor selection for MOCVD
Dr. Francis Maury
Journal:
Chemical Vapor Deposition
Year:
1996
Language:
english
File:
PDF, 367 KB
Your tags:
english, 1996
7
MOCVD challenge, vol. 2: A survey of GaInAsP-GaAs for photonic and electronic device applications. By Manijeh Razeghi, IOP Publishing, Bristol, UK 1995, XVI, 443 pp., hardcover, $110.00, ISBN 0-7503-0309-3
Francis Maury
Journal:
Chemical Vapor Deposition
Year:
1996
Language:
english
File:
PDF, 135 KB
Your tags:
english, 1996
8
InP HBTs: Growth, processing, and applications. Edited by B. Jalali, S. J. Pearton, Artech House, London 1995, IX, 421 pp., $76.00, ISBN 0-89006-724-4
Yutaka Matsuoka
Journal:
Chemical Vapor Deposition
Year:
1996
Language:
english
File:
PDF, 266 KB
Your tags:
english, 1996
9
GeSi strained layers and their applications. Edited by A. M. Stoneham, S. C. Jain, IOP Publishing, Bristol UK 1995, IXL, 368 pp., hardcover, ISBN 0-7503-0024-8
Gary S. Tompa
Journal:
Chemical Vapor Deposition
Year:
1996
Language:
english
File:
PDF, 145 KB
Your tags:
english, 1996
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