Volume 2; Issue 5

Chemical Vapor Deposition

Volume 2; Issue 5

1

Masthead

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 38 KB

english, 1996

2

The Present and future of CVD studies in Korea

Prof. S. S. Choi

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 222 KB

english, 1996

3

Low temperature, aerosol-assisted chemical vapor deposition (AACVD) of CdS, ZnS, and Cd1-xZnxS using monomeric single-source precursors: M(SOCCH3)2 TMEDA

Dr. May Nyman, Prof. Mark J. Hampden-Smith, Dr. Eileen N. Duesler

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 481 KB

english, 1996

4

Preparation of copper sulfide thin layers by a single-source MOCVD process

Prof. Ryôki Nomura, Keico Miyawaki, Takayuki Toyosaki, Prof. Haruo Matsuda

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 897 KB

english, 1996

5

Coating of TiO2 particles by chemical vapor deposition of SiO2

Quint. H. Powell, Prof. Toivo. T. Kodas, Dr. Bruce M. Anderson

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 694 KB

english, 1996

6

Chemical vapor deposition of Gallium selenide and indium selenide nanoparticles

Dr. Sarah L. Stoll, Dr. Edward G. Gillan, Prof. Andrew R. Barron

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 530 KB

english, 1996

7

Metal-organic vapor phase epitaxial growth of cubic Gallium selenide, Ga2Se3

Dr. Tat Lin Ng, Dr. Nicolas Maung, Dr. Guanghan Fan, Dr. Ian B. Poole, Prof. John O. Williams, Dr. Andrew C. Wright, Dr. Douglas F. Foster, David J. Cole-Hamilton

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 1.46 MB

english, 1996

8

Thin film growth and microstructure analysis of CeO2 prepared by MOCVD

Dr. Michael Becht, Dr. Tadataka Morishita

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 1.18 MB

english, 1996

9

The influence of Fe-group metals on the CVD of titanium carbide

Dr. Igor Y. Konyashin

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 2.87 MB

english, 1996

10

Announcement and call for papers

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 82 KB

english, 1996

11

Chemical vapor deposition: Thermal and plasma deposition of electronic materials. By S. Sivaram, Van Nostrand Reinhold, New York 1995, ix, 292 pp., hardcover, $49.00, ISBN 0-442-01079-6

Mark S. Hammond

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 129 KB

english, 1996

12

Encyclopedia of applied physics, Vol. 11: Mössbauer effect to nuclear structure. Edited by George L. Trigg, VCH, New York 1994, XII, 606 pp., hardcover, $300.00 (subscription price $250.00), ISBN 3-527-28133-9

Dietrich Haarer

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 266 KB

english, 1996

13

Encyclopedia of applied physics, Vol. 13: Order-encyclopedia of applied physics, Vol. 13: Order-disorder transitions to physics and engineering organizations. Edited by George L. Trigg, VCH, New York 1995, XII, 598 pp., hardcover, DM450.00 (subscription price DM 398.00), ISBN 3-527-28135-5

Dietrich Haarer

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 152 KB

english, 1996

14

Inorganic experiments. Edited by J. Derek Woollins, VCH, Weinheim 1994, XV, 286 pp., softcover, DM 58, ISBN 3-527-29253-5

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 152 KB

english, 1996

15

In situ scanning electron microscopy in materials research. Edited by K. Wetzig, D. Schulze, Akademie Verlag, Berlin 1995, 244 pp., hardcover, DM 118.00, ISBN 3-05-501305-0

Oleg Bostanjoglo

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 150 KB

english, 1996

16

In situ scanning electron microscopy in materials research. Edited by K. Wetzig, D. Schulze, Akademie Verlag, Berlin 1995, 244 pp., hardcover, DM 118.00, ISBN 3-05-501305-0

Oleg Bostanjoglo

Journal:

Chemical Vapor Deposition

Year:

1996

Language:

english

File:

PDF, 150 KB

english, 1996

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