Specific features of intensification of silicon etching in...

Specific features of intensification of silicon etching in CF4/O2plasma

Yu. N. Grigoryev, A. G. Gorobchuk
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Volume:
36
Language:
english
Pages:
12
DOI:
10.1134/s106373970705006x
Date:
September, 2007
File:
PDF, 253 KB
english, 2007
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