Volume 36; Issue 5

Main
Russian Microelectronics
Volume 36; Issue 5

Russian Microelectronics

Volume 36; Issue 5

1

Using a chromatic-aberration correction system to achieve sub-1.6-nm resolutions of a focused-ion-beam microscope designed for characterization and processing

V. A. Zhukov, A. I. Titov, A. V. Zav’yalova

Journal:

Russian Microelectronics

Year:

2007

Language:

english

File:

PDF, 302 KB

english, 2007

2

Transformations of porous layers upon high-temperature annealing: Simulation

T. B. Govorukha, A. V. Zverev, I. G. Neizvestny, N. L. Shwartz, Z. Sh. Yanovitskaya

Journal:

Russian Microelectronics

Year:

2007

Language:

english

File:

PDF, 815 KB

english, 2007

3

The algorithmic model of a pipelined analog-to-digital converter

Yu. B. Rogatkin

Journal:

Russian Microelectronics

Year:

2007

Language:

english

File:

PDF, 155 KB

english, 2007

4

Strain transmission from a substrate to a piezoresistive mesa

Journal:

Russian Microelectronics

Year:

2007

Language:

english

File:

PDF, 251 KB

english, 2007

5

Control of the adhesion strength of thin metal films in multilayer structures

Z. I. Taliashvili, L. R. Vardosanidze, L. B. Jangidze, A. N. Tavkhelidze

Journal:

Russian Microelectronics

Year:

2007

Language:

english

File:

PDF, 161 KB

english, 2007

6

Specific features of intensification of silicon etching in CF4/O2plasma

Yu. N. Grigoryev, A. G. Gorobchuk

Journal:

Russian Microelectronics

Year:

2007

Language:

english

File:

PDF, 253 KB

english, 2007

7

Aspect-ratio-independent anisotropic silicon etching in a plasma chemical cyclic process

O. V. Morozov, I. I. Amirov

Journal:

Russian Microelectronics

Year:

2007

Language:

english

File:

PDF, 242 KB

english, 2007

8

Sample-and-hold circuits for high-speed A/D converters

A. S. Gumenyuk, Yu. I. Bocharov

Journal:

Russian Microelectronics

Year:

2007

Language:

english

File:

PDF, 348 KB

english, 2007