![](/img/cover-not-exists.png)
Precise determination of lattice parameter and thermal expansion coefficient of silicon between 300 and 1500 K
Okada, Yasumasa, Tokumaru, YozoVolume:
56
Year:
1984
Language:
english
DOI:
10.1063/1.333965
File:
PDF, 752 KB
english, 1984