Atomic Layer Deposition of LaF3 Thin Films using La(thd)3...

Chemical Vapor Deposition 2008 Vol. 14; Iss. 3-4

Atomic Layer Deposition of LaF3 Thin Films using La(thd)3 and TiF4 as Precursors

Tero Pilvi, Esa Puukilainen, Kai Arstila, Markku Leskelä, Mikko Ritala
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
14
Year:
2008
Language:
english
Pages:
7
DOI:
10.1002/cvde.200706681
File:
PDF, 247 KB
english, 2008
Conversion to is in progress
Conversion to is failed