Thermodynamic approach to the redistribution of boron and fluorine implanted at the interface of an SiO2/Si system
F. Réti, Z. Sassi, L. Kaabi, J.-C. Bureau, H. Vincent, B. BallandVolume:
30
Year:
2000
Language:
english
Pages:
4
DOI:
10.1002/1096-9918(200008)30:13.0.co;2-m
File:
PDF, 79 KB
english, 2000