XPS analysis of ultrathin SiO2 film growth on Si by ozone
S. Ichimura, K. Koike, A. Kurokawa, K. Nakamura, H. ItohVolume:
30
Year:
2000
Language:
english
Pages:
5
DOI:
10.1002/1096-9918(200008)30:13.0.co;2-0
File:
PDF, 97 KB
english, 2000