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Oxide and interface trap densities estimation in ultrathin W/La2O3/Si MOS capacitors
M. Mamatrishat, T. Kubota, T. Seki, K. Kakushima, P. Ahmet, K. Tsutsui, Y. Kataoka, A. Nishiyama, N. Sugii, K. Natori, T. Hattori, H. IwaiVolume:
52
Year:
2012
Language:
english
Pages:
1
DOI:
10.1016/j.microrel.2011.12.025
File:
PDF, 392 KB
english, 2012