Physical properties and electrical characteristics of...

Microelectronics Reliability 2012 Vol. 52; Iss. 6

Physical properties and electrical characteristics of H2O-based and O3-based HfO2 films deposited by ALD

Jibin Fan, Hongxia Liu, Qianwei Kuang, Bo Gao, Fei Ma, Yue Hao
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Volume:
52
Year:
2012
Language:
english
Pages:
1
DOI:
10.1016/j.microrel.2012.01.010
File:
PDF, 686 KB
english, 2012
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