In situ spectroscopic ellipsometry of hydrogen-argon plasma...

In situ spectroscopic ellipsometry of hydrogen-argon plasma cleaned silicon surfaces

Ch. Förster, F. Schnabel, P. Weih, Th. Stauden, O. Ambacher, J. Pezoldt
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Volume:
455-456
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2003.11.255
File:
PDF, 485 KB
english, 2004
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