In situ spectroscopic ellipsometry of hydrogen-argon plasma cleaned silicon surfaces
Ch. Förster, F. Schnabel, P. Weih, Th. Stauden, O. Ambacher, J. PezoldtVolume:
455-456
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.tsf.2003.11.255
File:
PDF, 485 KB
english, 2004