Infrared spectroscopic ellipsometry applied to the...

Thin Solid Films 2004 Vol. 455-456; Iss. none

Infrared spectroscopic ellipsometry applied to the characterization of ultra shallow junction on silicon and SOI

C. Defranoux, T. Emeraud, S. Bourtault, J. Venturini, P. Boher, M. Hernandez, C. Laviron, T. Noguchi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
455-456
Year:
2004
Language:
english
Pages:
7
DOI:
10.1016/j.tsf.2004.02.008
File:
PDF, 826 KB
english, 2004
Conversion to is in progress
Conversion to is failed