Real-time monitoring and control of epitaxial semiconductor...

Thin Solid Films 1998 Vol. 313-314; Iss. none

Real-time monitoring and control of epitaxial semiconductor growth in a production environment by in situ spectroscopic ellipsometry

B Johs, C Herzinger, J.H Dinan, A Cornfeld, J.D Benson, D Doctor, G Olson, I Ferguson, M Pelczynski, P Chow, C.H Kuo, S Johnson
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Volume:
313-314
Year:
1998
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(97)00870-5
File:
PDF, 180 KB
english, 1998
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