Nanoscale patterning of self-assembled monolayers by e-beam...

Microelectronic Engineering 2001 Vol. 57-58; Iss. none

Nanoscale patterning of self-assembled monolayers by e-beam lithography

Thomas Weimann, Wolfgang Geyer, Peter Hinze, Volker Stadler, Wolfgang Eck, Armin Gölzhäuser
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Volume:
57-58
Year:
2001
Language:
english
Pages:
5
DOI:
10.1016/s0167-9317(01)00454-3
File:
PDF, 319 KB
english, 2001
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