Cleaning status on low-k dielectric in advanced VLSI...

Microelectronic Engineering 2001 Vol. 57-58; Iss. none

Cleaning status on low-k dielectric in advanced VLSI interconnect:: Characterisation and principal issues

D Louis, A Beverina, C Arvet, E Lajoinie, C Peyne, D Holmes, D Maloney
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Volume:
57-58
Year:
2001
Language:
english
Pages:
7
DOI:
10.1016/s0167-9317(01)00548-2
File:
PDF, 742 KB
english, 2001
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