Strippable aqueous base developable negative photoresist for high aspect ratio micromachining
Margarita Chatzichristidi, Ioannis Raptis, Constantinos D. Diakoumakos, Nikos Glezos, Panagiotis Argitis, Merope SanopoulouVolume:
61-62
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0167-9317(02)00481-1
File:
PDF, 306 KB
english, 2002