Volume 61-62; Issue none

Main
Microelectronic Engineering
Volume 61-62; Issue none

Microelectronic Engineering

Volume 61-62; Issue none

1

Simulation study of ‘perfect lenses’ for near-field optical nanolithography

R.J. Blaikie, S.J. McNab

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 311 KB

english, 2002

2

Electrical properties of light-addressed sub-μm electrodes fabricated by use of nanostencil-technology

Volker Bucher, Jürgen Brugger, Dieter Kern, Gyu Man Kim, Markus Schubert, Wilfried Nisch

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.11 MB

english, 2002

3

Micromachined capacitive ultrasonic transducers fabricated using silicon on insulator wafers

E. Cianci, V. Foglietti, G. Caliano, M. Pappalardo

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 768 KB

english, 2002

4

Roughness characterization in positive and negative resists

Vassilios Constantoudis, Evangelos Gogolides, Angeliki Tserepi, Constantinos D. Diakoumakos, Evangelos S. Valamontes

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 150 KB

english, 2002

5

Nano-structured anti-reflective surfaces replicated by hot embossing

C. David, P. Häberling, M. Schnieper, J. Söchtig, C. Zschokke

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 999 KB

english, 2002

6

Design and fabrication of diffractive optical elements for optical tweezer arrays by means of e-beam lithography

D. Cojoc, E. Di Fabrizio, L. Businaro, S. Cabrini, F. Romanato, L. Vaccari, M. Altissimo

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1010 KB

english, 2002

7

Advanced optical lithography development, from UV to EUV

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 744 KB

english, 2002

8

SNOM/AFM microprobe integrated with piezoresistive cantilever beam for multifunctional surface analysis

P. Grabiec, T. Gotszalk, J. Radojewski, K. Edinger, N. Abedinov, I.W. Rangelow

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 685 KB

english, 2002

9

Electron beam photoresists for nanoimprint lithography

C. Gourgon, C. Perret, G. Micouin

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 483 KB

english, 2002

10

New fabrication technique for nano-MOS transistors with W=25 nm and L=25 nm using only conventional optical lithography

J.T. Horstmann, K.F. Goser

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 531 KB

english, 2002

11

Fabrication of carbon nanotips in a scanning electron microscope for use as electron field emission sources

S.D. Johnson, D.G. Hasko, K.B.K. Teo, W.I. Milne, H. Ahmed

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 356 KB

english, 2002

12

Fabrication and magnetic properties of prepatterned epitaxial nanodots

M. Kläui, P.A. Lewis, C.A.F. Vaz, A. Bleloch, R. Speaks, M.C. Blamire, J.A.C. Bland, H. Ahmed

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 775 KB

english, 2002

13

Control of domain structures in magnetic multilayer using submicron-patterned antiferromagnetic structure

Takashi Kimura, Yoshio Itagaki, Fujio Wakaya, Kenji Gamo

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 551 KB

english, 2002

14

Process integration of 20 nm electron beam lithography and nanopatterning for ultimate MOSFET device fabrication

J. Kretz, L. Dreeskornfeld

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 599 KB

english, 2002

15

Thermal lithography for 0.1 μm pattern fabrication

M. Kuwahara, C. Mihalcea, N. Atoda, J. Tominaga, H. Fuji, T. Kikukawa

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 580 KB

english, 2002

16

Study of multi-walled carbon nanotube structures fabricated by PMMA suspended dispersion

S.-B. Lee, K.B.K. Teo, M. Chhowalla, D.G. Hasko, G.A.J. Amaratunga, W.I. Milne, H. Ahmed

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 604 KB

english, 2002

17

Poly-Si gate patterning issues for ultimate MOSFET

D. Louis, M.E. Nier, C. Fery, M. Heitzmann, A.M. Papon, S. Renard

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 298 KB

english, 2002

18

Automatic calibration of lithography simulation parameters using multiple data sets

Jeffrey Byers, Chris Mack, Richard Huang, Sven Jug

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 157 KB

english, 2002

19

Electrical and noise characterization of suspended silicon wires

M. Macucci, B. Pellegrini, G. Pennelli, M. Piotto

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 218 KB

english, 2002

20

Photo-acid generator having aromatic ketone structure for ArF chemically amplified resist

Katsumi Maeda, Kaichiro Nakano, Shigeyuki Iwasa, Etsuo Hasegawa

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 468 KB

english, 2002

21

Maskless nanofabrication using the electrostatic attachment of gold particles to electrically patterned surfaces

Patrick Mesquida, Andreas Stemmer

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 265 KB

english, 2002

22

Design and fabrication of colloid-based vertical nanoscale devices

A.J. Parker, P.A. Childs, R.E. Palmer

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 285 KB

english, 2002

23

Optimisation of EUV mask absorbing layers

Jean Yves Robic, Patrick Schiavone, Vincent Rodillon, Renaud Payerne

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 900 KB

english, 2002

24

X-ray lithography fabrication of a zone plate for X-rays in the range from 15 to 30 keV

Matteo Altissimo, Filippo Romanato, Lisa Vaccari, Luca Businaro, Danut Cojoc, Burkhard Kaulich, Stefano Cabrini, Enzo Di Fabrizio

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 380 KB

english, 2002

25

Manufacture of single electron transistors using AFM manipulation on multiwalled carbon nanotubes

L. Roschier, R. Tarkiainen, M. Ahlskog, M. Paalanen, P. Hakonen

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 327 KB

english, 2002

26

PRIME process with Shipley SPR505A resist—simulations and experiments

K. Arshak, M. Mihov, A. Arshak, D. McDonagh, M. Pomeroy, M. Campion

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 838 KB

english, 2002

27

Nucleation control of CVD growth silicon nanocrystals for quantum devices

T. Baron, F. Mazen, C. Busseret, A. Souifi, P. Mur, F. Fournel, M.N. Séméria, H. Moriceau, B. Aspard, P. Gentile, N. Magnea

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1019 KB

english, 2002

28

Fabrication of single crystal Si cantilevers using a dry release process and application in a capacitive-type humidity sensor

S. Chatzandroulis, A. Tserepi, D. Goustouridis, P. Normand, D. Tsoukalas

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 524 KB

english, 2002

29

Imprint lithography using thermo-polymerisation of MMA

M. Sagnes, L. Malaquin, F. Carcenac, C. Vieu, C. Fournier

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 394 KB

english, 2002

30

A miniaturized cyclic PCR device—modeling and experiments

C.F. Chou, R. Changrani, P. Roberts, D. Sadler, J. Burdon, F. Zenhausern, S. Lin, A. Mulholland, N. Swami, R. Terbrueggen

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 467 KB

english, 2002

31

Dilute aqueous base developable resists for environmentally friendly and biocompatible processes

Constantinos D. Diakoumakos, Antonios Douvas, Ioannis Raptis, Sotiris Kakabakos, Dimitra Dimotikalli, Georgia Terzoudi, Panagiotis Argitis

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 485 KB

english, 2002

32

Silicon gate notching for patterning features with dimensions smaller than the resolution of the lithography

J Foucher, G Cunge, L Vallier, O Joubert

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.16 MB

english, 2002

33

Electron-beam nanolithography and line-edge roughness of acid-breakable resin-based positive resist

Toshio Sakamizu, Hiroshi Shiraishi

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.83 MB

english, 2002

34

Deeply etched two-dimensional photonic crystals fabricated on GaAs/AlGaAs slab waveguides by using chemically assisted ion beam etching

K. Avary, J.P. Reithmaier, F. Klopf, T. Happ, M. Kamp, A. Forchel

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 970 KB

english, 2002

35

Vacuum ultraviolet emission bands of LiLuF4:Tb3+ crystals in the spectral range from 157 to 200 nm

E. Sarantopoulou, Z. Kollia, A.C. Cefalas

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 138 KB

english, 2002

36

Highly selective etching of deep silica components using electron cyclotron resonance plasma

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 678 KB

english, 2002

37

A new vacuum pin chuck for ArF laser lithography

A. Une, P. Kunyoo, M. Mochida, K. Yoshitomi, , S. Matsui

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.26 MB

english, 2002

38

Microarrays and microfluidic devices: miniaturized systems for biological analysis

F. Vinet, P. Chaton, Y. Fouillet

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 506 KB

english, 2002

39

The role of mask charging in profile evolution and gate oxide degradation

K.P. Giapis, G.S. Hwang, O. Joubert

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.17 MB

english, 2002

40

Nanostructuring of aluminum-coated scanning near-field optical microscope probes by direct, laser thermal oxidation in water

D. Haefliger, A. Stemmer

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 306 KB

english, 2002

41

Electrostatically driven microgripper

B.E. Volland, H. Heerlein, I.W. Rangelow

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 961 KB

english, 2002

42

Template fabrication schemes for step and flash imprint lithography

T.C. Bailey, D.J. Resnick, D. Mancini, K.J. Nordquist, W.J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J.H. Baker, B.J. Choi, S. Johnson, M. Colburn, M. Meissl, S.V. Sreenivasan, J.G. Ekerdt, C.G. Wil

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 586 KB

english, 2002

43

Concept of floating-dot memory transistors on silicon-on-insulator substrate

O. Winkler, F. Merget, M. Heuser, B. Hadam, M. Baus, B. Spangenberg, H. Kurz

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 443 KB

english, 2002

44

Improving stamps for 10 nm level wafer scale nanoimprint lithography

M. Beck, M. Graczyk, I. Maximov, E.-L. Sarwe, T.G.I. Ling, M. Keil, L. Montelius

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 495 KB

english, 2002

45

Fabrication of wire-MOSFETs on silicon-on-insulator substrate

M. Heuser, M. Baus, B. Hadam, O. Winkler, B. Spangenberg, R. Granzner, M. Lemme, H. Kurz

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 218 KB

english, 2002

46

A colloid micro-thruster system

Jijun Xiong, Zhaoying Zhou, Xiongying Ye, Xiaohao Wang, Yanyin Feng, Yonghong Li

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 397 KB

english, 2002

47

Evolution and control of the structure of a SiO2/semiconductor nanoelectronics material

K. Beltsios, P. Normand, E. Kapetanakis, D. Tsoukalas, A. Travlos

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 462 KB

english, 2002

48

Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography

Shazia Yasin, D.G. Hasko, H. Ahmed

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 541 KB

english, 2002

49

Fabrication of the thin film slot antenna arrays for receiving 28 THz-CO2 laser radiation

Yoshizumi Yasuoka, Shoji Hashimoto, Yasuhiko Abe, Kenji Gamo

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 454 KB

english, 2002

50

Multiple imprinting in UV-based nanoimprint lithography: related material issues

M. Bender, M. Otto, B. Hadam, B. Spangenberg, H. Kurz

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 442 KB

english, 2002

51

Progress in 157-nm lithography development for 70-nm node

Toshiro Itani, Wataru Wakamiya

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.91 MB

english, 2002

52

Wafer scale submicron optical grating for the picometre measurement of aberrations and stitching errors in step and repeat cameras

Y. Jourlin, J. Jay, F. Pigeon, G. Bouchet, O. Parriaux, P. van Dijk, R. Pellens, S. Topçu, Y. Alayli, M. Bonis

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 980 KB

english, 2002

53

Groove design of vacuum chucks for hot embossing lithography

L. Bendfeldt, H. Schulz, N. Roos, H.-C. Scheer

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 427 KB

english, 2002

54

Quantum wire fabrication from compensating-layer GaAs–AlGaAs heterostructures

D. Kähler, U. Kunze, D. Reuter, A.D. Wieck

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 616 KB

english, 2002

55

The effect of cross-coupling in a bidirectional electron pump

T. Altebaeumer, H. Ahmed

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 782 KB

english, 2002

56

Fabrication of magnetic rings for high density memory devices

Zheng Cui, J. Rothman, M. Klaui, L. Lopez-Diaz, C.A.F. Vaz, J.A.C. Bland

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 703 KB

english, 2002

57

Miniature electrostatic column for a compact scanning electron microscope

T. Ambe, H. Tanaka, H. Teguri, I. Honjo, A. Ito

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 527 KB

english, 2002

58

Fabrication of multiple nano-electrodes for molecular addressing using high-resolution electron beam lithography and their replication using soft imprint lithography

F. Carcenac, L. Malaquin, C. Vieu

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 785 KB

english, 2002

59

He2 60–90 nm photon source for investigating photodissociation dynamics of potential X-UV resists

A.C. Cefalas, E. Sarantopoulou, P. Argitis, E. Gogolides

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 149 KB

english, 2002

60

Realization of two-dimensional optical devices using photonic band gap structures on silicon-on-insulator

T. Charvolin, E. Hadji, E. Picard, M. Zelsman, M. Assous, B. Dalzotto, M.E. Nier, S. Tedesco, X. Letartre, P. Rojo-Roméo, C. Seassal

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 293 KB

english, 2002

61

Strippable aqueous base developable negative photoresist for high aspect ratio micromachining

Margarita Chatzichristidi, Ioannis Raptis, Constantinos D. Diakoumakos, Nikos Glezos, Panagiotis Argitis, Merope Sanopoulou

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 306 KB

english, 2002

62

Surface modification of Si-containing polymers during etching for bilayer lithography

D. Eon, L. de Poucques, M.C. Peignon, Ch. Cardinaud, G. Turban, A. Tserepi, G. Cordoyiannis, E.S. Valamontes, I. Raptis, E. Gogolides

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 163 KB

english, 2002

63

Influence of implantation dose on the charge storage characteristics of MOS memory devices with low energy Si implanted gate oxides

E. Kapetanakis, P. Normand, D. Tsoukalas, K. Beltsios

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 136 KB

english, 2002

64

Fabrication of micromechanical mass-sensitive resonators with increased mass resolution using SOI substrate

B.H. Kim, D.P. Kern, S. Raible, U. Weimar

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 588 KB

english, 2002

65

Room-temperature and low-pressure nanoimprint lithography

A. Lebib, Y. Chen, E. Cambril, P. Youinou, V. Studer, M. Natali, A. Pépin, H.M. Janssen, R.P. Sijbesma

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 934 KB

english, 2002

66

Challenge of ashing and cleaning on SiOC-H dielectric: characterization and main issues

O. Louveau, D. Louis, M. Assous, R. Blanc, P. Brun, S. Lamy, E. Lajoinie

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 614 KB

english, 2002

67

Batch processing of nanometer-scale electrical circuitry based on in-situ grown single-walled carbon nanotubes

L. Marty, V. Bouchiat, A.M. Bonnot, M. Chaumont, T. Fournier, S. Decossas, S. Roche

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 303 KB

english, 2002

68

Fabrication of Si-based nanoimprint stamps with sub-20 nm features

I. Maximov, E.-L. Sarwe, M. Beck, K. Deppert, M. Graczyk, M.H. Magnusson, L. Montelius

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 599 KB

english, 2002

69

Wet etching of linear Fresnel zone plates for hard X-rays

C. David, B. Nöhammer, E. Ziegler

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 639 KB

english, 2002

70

Removal of SU-8 photoresist for thick film applications

Paul M. Dentinger, W.Miles Clift, Steven H. Goods

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 152 KB

english, 2002

71

High aspect ratio patterning with a proximity ultraviolet source

Paul M. Dentinger, Karen L. Krafcik, Kelby L. Simison, Richard P. Janek, John Hachman

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 445 KB

english, 2002

72

Epitaxial growth of germanium dots on Si (001) surface covered by a very thin silicon nitride layer

M. Derivaz, P. Noé, D. Jalabert, J.L. Rouviére, D. Buttard, D. Sotta, A. Barski

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.74 MB

english, 2002

73

Image quality improvement of a production CD-SEM using a porous silicon sample

P. Dirksen, R. Elfrink, M. Benndorf, C.A.H. Juffermans

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 288 KB

english, 2002

74

PDMS-based microfluidic devices for biomedical applications

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 609 KB

english, 2002

75

Proposal of at-wavelength PDI for EUVL optics alignment by using a compact undulator

Y. Gomei, K. Sugisaki, Y. Zhu, M. Niibe

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 194 KB

english, 2002

76

Controlling sub-100-nm lithographic imaging performance by optical area measurement

I. Grodnensky, S. Mizutani, S. Slonaker

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 238 KB

english, 2002

77

Optical problems of wafer inspection with DUV microscopy for structures of about 0.1 μm

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 2.32 MB

english, 2002

78

XY stages driving an electron beam mastering system for high density optical recording

Sumio Hosaka, Tatsundo Suzuki, Masahiro Yamaoka, Keizo Katoh, Fumio Isshiki, Mitsuhide Miyamoto, Yasushi Miyauchi, Akira Arimoto, Tetsuya Nishida

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 935 KB

english, 2002

79

Reduction of defect density on blanks: application to the extreme ultraviolet lithography

J. Hue, E. Quesnel, V. Muffato, C. Pellé, D. Granier, S. Favier, P. Besson

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 549 KB

english, 2002

80

Application of floatable oxide (FOx-12) for nanometer magnetic particle fabrication

P. Jedrasik, M. Hanson

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.77 MB

english, 2002

81

Electrostatic chuck behaviour at ambient conditions

G. Kalkowski, S. Risse, V. Guyenot

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 246 KB

english, 2002

82

Nanostructures of pyramidal shape, technology and applications

Irina Kleps, Anca Angelescu, Marioara Avram, Mihaela Miu, Monica Simion

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 920 KB

english, 2002

83

Non-destructive method for monitoring glass transitions in thin photoresist films

Ioannis Raptis, Constantinos D. Diakoumakos

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 171 KB

english, 2002

84

Imaging results for resist films exposed to EUV radiation

Manhyoung Ryoo, Shigeru Shirayone, Ei Yano, Shinji Okazaki, Sujin Kang

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 550 KB

english, 2002

85

Nanoimprint lithography for organic electronics

C. Clavijo Cedeño, J. Seekamp, A.P. Kam, T. Hoffmann, S. Zankovych, C.M. Sotomayor Torres, C. Menozzi, M. Cavallini, M. Murgia, G. Ruani, F. Biscarini, M. Behl, R. Zentel, J. Ahopelto

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 593 KB

english, 2002

86

Stress characteristics in EUV mask Mo/Si multilayers deposited by ion beam sputtering

C. Teyssier, E. Quesnel, V. Muffato, P. Schiavone

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 187 KB

english, 2002

87

Fluoropolymer-based resist materials for 157-nm lithography

M. Toriumi, N. Shida, T. Yamazaki, H. Watanabe, S. Ishikawa, T. Itani

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 296 KB

english, 2002

88

EPL—results and potential applications

M. McCallum, C.A.H. Juffermans, K. Suzuki, S. Shimizu

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.04 MB

english, 2002

89

A new masking method for protecting silicon surfaces during anisotropic silicon wet etching

P. Normand, K. Beltsios, A. Tserepi, K. Aidinis, D. Tsoukalas, C. Cardinaud

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 658 KB

english, 2002

90

Nanoimprint lithography for the fabrication of DNA electrophoresis chips

A. Pépin, P. Youinou, V. Studer, A. Lebib, Y. Chen

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 306 KB

english, 2002

91

First and second generation purely thermoset stamps for hot embossing

N. Roos, H. Schulz, L. Bendfeldt, M. Fink, K. Pfeiffer, H.-C. Scheer

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.14 MB

english, 2002

92

Chemical nano-patterning using hot embossing lithography

H. Schift, L.J. Heyderman, C. Padeste, J. Gobrecht

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 576 KB

english, 2002

93

High power EUV sources based on gas discharge plasmas and laser produced plasmas

G. Schriever, U. Stamm, K. Gäbel, M. Darscht, V. Borisov, O. Khristoforov, A. Vinokhodov

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 563 KB

english, 2002

94

The role of secondary electrons in electron-beam-induced-deposition spatial resolution

N. Silvis-Cividjian, C.W. Hagen, L.H.A. Leunissen, P. Kruit

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 257 KB

english, 2002

95

Illumination optimization of periodic patterns for maximum process window

Robert Socha, Mark Eurlings, Frank Nowak, Jo Finders

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 839 KB

english, 2002

96

Continuously chirped gratings for DFB-lasers fabricated by direct write electron-beam lithography

R. Steingrüber, M. Möhrle, A. Sigmund, W. Fürst

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 611 KB

english, 2002

97

Fabrication of microfluidic devices for AC electrokinetic fluid pumping

V. Studer, A. Pépin, Y. Chen, A. Ajdari

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 360 KB

english, 2002

98

Sub-μm thick rubber-elastic stamp on rigid support for high reliability microcontact printing

M. Tormen, T. Borzenko, B. Steffen, G. Schmidt, L.W. Molenkamp

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 332 KB

english, 2002

99

Colourtone lithography

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 614 KB

english, 2002

100

Combination multiple focal planes and PSM for sub 120 nm node with KrF lithography: study of the proximity effects

S. Manakli, Y. Trouiller, P. Schiavone, P. Spinelli, O. Le-Borgne, J.-P. Chollet, Y. Rody, P.-J. Goirand

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.13 MB

english, 2002

101

Lithography and self-assembly for nanometer scale magnetism

S. Anders, S. Sun, C.B. Murray, C.T. Rettner, M.E. Best, T. Thomson, M. Albrecht, J.-U. Thiele, E.E. Fullerton, B.D. Terris

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.69 MB

english, 2002

102

An X-ray tomography facility for I.C. industry at STMicroelectronics Grenoble

S. Bord, A. Clement, J.C. Lecomte, J.C. Marmeggi

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.09 MB

english, 2002

103

Resistless patterning of quantum nanostructures by local anodization with an atomic force microscope

V. Bouchiat, M. Faucher, T. Fournier, B. Pannetier, C. Thirion, W. Wernsdorfer, N. Clément, D. Tonneau, H. Dallaporta, S. Safarov, J.C. Villegier, D. Fraboulet, D. Mariolle, J. Gautier

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 498 KB

english, 2002

104

Distortions in advanced photomasks from soft pellicles

E.P. Cotte, R.L. Engelstad, E.G. Lovell, Y.M. Shkel, F.O. Eschbach, E.Y. Shu, D. Tanzil, R.M. Calhoun

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 548 KB

english, 2002

105

Photonic band gap material for integrated photonic application: technological challenges

M. François, J. Danglot, B. Grimbert, P. Mounaix, M. Muller, O. Vanbésien, D. Lippens

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 919 KB

english, 2002

106

One-step lithography for fabrication of multifunction diffractive structures with grey-tone mask

Fuhua Gao, Jun Yao, Yangsu Zeng, Shiwei Xie, Yongkang Guo, Zheng Cui

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 296 KB

english, 2002

107

Maskless electron beam lithography: prospects, progress, and challenges

T.R. Groves, D. Pickard, B. Rafferty, N. Crosland, D. Adam, G. Schubert

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 344 KB

english, 2002

108

Ion projection lithography below 70 nm: tool performance and resist process

S. Hirscher, M. Kümmel, O. Kirch, W.-D. Domke, A. Wolter, R. Käsmaier, H. Buschbeck, E. Cekan, A. Chalupka, A. Chylik, S. Eder, C. Horner, H. Löschner, R. Nowak, G. Stengl, T. Windischbauer, M. Zeinin

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 859 KB

english, 2002

109

Stability of DRAM-devices with respect to 75 keV helium ion beam irradiation as required for ion projection lithography of critical layers

S. Hirscher, M. Kümmel, A. Wolter, R. Kaesmaier, A. Jaeschke

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 240 KB

english, 2002

110

The inclusion of secondary electrons and Bremsstrahlung X-rays in an electron beam resist model

V.V. Ivin, M.V. Silakov, D.S. Kozlov, K.J. Nordquist, B. Lu, D.J. Resnick

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 294 KB

english, 2002

111

Silicon nanofabrication by electron beam lithography and laser-assisted electrochemical size-reduction

Robert Juhasz, Jan Linnros

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 406 KB

english, 2002

112

Mask characteristics for projection electron-beam lithography with demagnification imaging

Peng Kaiwu, Zhang Fuan, Wu Guijun, Gu Wenqi, Sun Xia, Kang Niankan, Pu Qirong, Ding Zejun

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 193 KB

english, 2002

113

Characteristics of Ru as a buffer layer or an etch stopper for EUVL mask patterning

B.T. Lee, E. Hoshino, M. Takahashi, T. Yoneda, H. Yamanashi, H. Hoko, A. Chiba, M. Ito, T. Ogawa, S. Okazaki

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 479 KB

english, 2002

114

Molecular contamination mitigation in EUVL by environmental control

Norbert Koster, Bas Mertens, Rik Jansen, Annemieke van de Runstraat, Frank Stietz, Marco Wedowski, Hans Meiling, Roman Klein, Alexander Gottwald, Frank Scholze, Matthieu Visser, Ralph Kurt, Peer Zalm,

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 863 KB

english, 2002

115

Determination of image placement accuracy due to EUV mask fabrication procedures

A.R. Mikkelson, R.L. Engelstad, E.G. Lovell

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 315 KB

english, 2002

116

Environment-proof writing chamber for next generation electron beam mask writing system

M. Ogasawara, K. Akeno, R. Hayashi, S. Yanaga, N. Kobayashi, S. Nishimura, S. Mitsui, M. Shimizu, H. Kusakabe, T. Tojo, S. Yasuda

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 378 KB

english, 2002

117

Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies

M. Peuker, M.H. Lim, Henry I. Smith, R. Morton, A.K. van Langen-Suurling, J. Romijn, E.W.J.M. van der Drift, F.C.M.J.M. van Delft

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.05 MB

english, 2002

118

Fabrication and optical measurements of silicon on insulator photonic nanostructures

D. Peyrade, Y. Chen, A. Talneau, M. Patrini, M. Galli, F. Marabelli, M. Agio, L.C. Andreani, E. Silberstein, P. Lalanne

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 511 KB

english, 2002

119

A new positive electron-beam resist material composed of catechol derivatives

Satoshi Saito, Naoko Kihara, Tohru Ushirogouchi

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 336 KB

english, 2002

120

Multi-adduct derivatives of C60 for electron beam nano-resists

Tetsuya Tada, Koichiro Uekusa, Toshihiko Kanayama, Takahiro Nakayama, Ross Chapman, Wai Yee Cheung, Louise Eden, Irfan Hussain, Mark Jennings, Jacob Perkins, Marcus Phillips, Jon A. Preece, Elwyn Shel

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 261 KB

english, 2002

121

An energy analyzer for high-speed secondary electrons accelerated in inspection SEM imaging

A. Takafuji, H. Murakoshi, H. Shinada, M. Matsui, H. Nishiyama, M. Nozoe

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 463 KB

english, 2002

122

Dynamic analysis of a stencil mask

H. Takenaka, H. Yamashita, Y. Tomo, Y. Kojima, M. Watanabe, T. Iwasaki, M. Yamabe

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 216 KB

english, 2002

123

Point-deflection method for in-situ stress determination of advanced lithographic masks

N. Tang, R.L. Engelstad, E.G. Lovell

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 278 KB

english, 2002

124

III-V Semiconductor based MOEMS devices for optical telecommunications

M. Garrigues, J.L. Leclercq, P. Viktorovitch

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 2.23 MB

english, 2002

125

Nano-island fabrication by electron beam lithography and selective oxidation of Al-rich AlGaAs layers for single electron device application

M. De Vittorio, M.T. Todaro, V. Vitale, A. Passaseo, T.K. Johal, R. Rinaldi, R. Cingolani, S. Bernardi

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 482 KB

english, 2002

126

Resists for next generation lithography

Robert L. Brainard, George G. Barclay, Erik H. Anderson, Leonidas E. Ocola

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 862 KB

english, 2002

127

Evaluation of ion projection using heavy ions suitable for resistless patterning of thin magnetic films

W.H. Bruenger, C. Dzionk, R. Berger, H. Grimm, A. Dietzel, F. Letzkus, R. Springer

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 238 KB

english, 2002

128

Biological lithography: development of a maskless microarray synthesizer for DNA chips

F. Cerrina, F. Blattner, W. Huang, Y. Hue, R. Green, S. Singh-Gasson, M. Sussman

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 771 KB

english, 2002

129

Simulation model of EUVL mask temperature rise during scanning exposure

Akira Chiba, Eiichi Hoshino, Hiromasa Yamanashi, Hiromasa Hoko, Byoung Taek Lee, Takashi Yoneda, Masaaki Ito, Taro Ogawa, Shinji Okazaki

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 702 KB

english, 2002

130

Modeling and experimental data using a new high rate ICP tool for dry etching 200 mm EPL masks

W.J. Dauksher, S.B. Clemens, D.J. Resnick, K.H. Smith, P.J.S. Mangat, S. Rauf, P. Stout, P.L.G. Ventzek, H. Ashraf, L. Lea, S. Hall, J. Hopkins, A. Chambers

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 478 KB

english, 2002

131

Investigation of phase shift mask distortion effect

Jinglei Du, Zheng Cui, XiaoCong Yuan, Yongkang Guo

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 300 KB

english, 2002

132

Electron-beam lithography to improve quality of computer-generated hologram

Feng Gao, Jianhua Zhu, Qizhong Huang, Yixiao Zhang, Yangsu Zeng, Fuhua Gao, Yongkang Guo, Zheng Cui

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 388 KB

english, 2002

133

Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1−x−y superlattices for high transmittance APSM at 193 nm wavelength

F.D. Lai, L.A. Wang

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 176 KB

english, 2002

134

Recent progress in EUV source development at GREMI

Smruti Ranjan Mohanty, Christophe Cachoncinlle, Claude Fleurier, Eric Robert, Jean-Michel Pouvesle, Raymond Viladrosa, Remi Dussart

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 308 KB

english, 2002

135

Using polydimethylsiloxane as a thermocurable resist for a soft imprint lithography process

L. Malaquin, F. Carcenac, C. Vieu, M. Mauzac

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 637 KB

english, 2002

136

HSQ hybrid lithography for 20 nm CMOS devices development

L. Mollard, G. Cunge, S. Tedesco, B. Dal’zotto, J. Foucher

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 751 KB

english, 2002

137

Ultra-thin silicon nitride by hot wire chemical vapor deposition (HWCVD) for deep sub-micron CMOS technologies

Parag C. Waghmare, Samadhan B. Patil, Alka Kumbhar, R.O. Dusane, V.Ramgopal Rao

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 341 KB

english, 2002

138

Characterization of optics and masks for the EUV lithography

Valérie Paret, Pierre Boher, Roland Geyl, Bernard Vidal, Magali Putero-Vuaroqueaux, Etienne Quesnel, Jean Yves Robic

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 2.85 MB

english, 2002

139

Polymer stamps for nanoimprinting

K. Pfeiffer, M. Fink, G. Ahrens, G. Gruetzner, F. Reuther, J. Seekamp, S. Zankovych, C.M. Sotomayor Torres, I. Maximov, M. Beck, M. Graczyk, L. Montelius, H. Schulz, H.-C. Scheer, F. Steingrueber

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 679 KB

english, 2002

140

Development of a laser-produced plasma source at 13.5 nm for the French extreme ultraviolet lithography test bench

M. Segers, M. Bougeard, E. Caprin, T. Ceccotti, D. Normand, M. Schmidt, O. Sublemontier

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 247 KB

english, 2002

141

Four-wave EUV interference lithography

H.H. Solak, C. David, J. Gobrecht, L. Wang, F. Cerrina

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 441 KB

english, 2002

142

High-density selective placement methods for carbon nanotubes

Emmanuel Valentin, Stephane Auvray, Julie Goethals, Justin Lewenstein, Laurence Capes, Arianna Filoramo, Aline Ribayrol, Ray Tsui, Jean-Philippe Bourgoin, Jean-Noel Patillon

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 779 KB

english, 2002

143

Midbandgap materials for sub-100-nm MOS transistors

T. Vieregge, J.T. Horstmann, K.F. Goser

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 278 KB

english, 2002

144

Electronic devices from electrodeposited metal nanowires

E.C. Walter, K. Ng, M.P. Zach, R.M. Penner, F. Favier

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1016 KB

english, 2002

145

Substrate dopant imaging for layout reconstruction of integrated-circuit layers

D.J. Weaver, J.R.A. Cleaver, L. Avery, H. Ahmed

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 1.43 MB

english, 2002

146

Concept, construction and commissioning of an alignment system for deep X-ray lithography

O. Wilhelmi, S.S. Peredkov, A.L. Bogdanov

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 159 KB

english, 2002

147

Influence of substrate on mechanical properties of TiN/NbN superlattices

H. Wrzesińska, P. Grabiec, Z. Rymuza, M. Misiak

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 731 KB

english, 2002

148

Evaluation of cleaning techniques for EUVL mask by using a highly sensitive particle detection system

T Yoneda, H Hoko, E Hoshino, T Ogawa, S Okazaki, Y Isobe, T Matsumoto, T Mizoguchi

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 580 KB

english, 2002

149

Micro storage measurement unit

Yonghong Li, Wendong Zhang, Haifeng Dong, Jijun Xiong, Jun Liu, Tao Guo

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 316 KB

english, 2002

150

Novel nanodevices for electronics: fabrication and characteristics

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 30 KB

english, 2002

151

No more time for incubation: The emerging technologies need to emerge now!

Thomas Skotnicki

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 28 KB

english, 2002

152

Next generation lithography: When, why, and at what cost?

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 26 KB

english, 2002

153

ASET development activities for future lithographic technologies

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 28 KB

english, 2002

154

Preface

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 27 KB

english, 2002

155

Author Index

Journal:

Microelectronic Engineering

Year:

2002

Language:

english

File:

PDF, 110 KB

english, 2002

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