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Surface modification of Si-containing polymers during etching for bilayer lithography
D. Eon, L. de Poucques, M.C. Peignon, Ch. Cardinaud, G. Turban, A. Tserepi, G. Cordoyiannis, E.S. Valamontes, I. Raptis, E. GogolidesVolume:
61-62
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0167-9317(02)00482-3
File:
PDF, 163 KB
english, 2002