High aspect ratio patterning with a proximity ultraviolet...

Microelectronic Engineering 2002 Vol. 61-62; Iss. none

High aspect ratio patterning with a proximity ultraviolet source

Paul M. Dentinger, Karen L. Krafcik, Kelby L. Simison, Richard P. Janek, John Hachman
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Volume:
61-62
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0167-9317(02)00491-4
File:
PDF, 445 KB
english, 2002
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