Ion projection lithography below 70 nm: tool performance...

Microelectronic Engineering 2002 Vol. 61-62; Iss. none

Ion projection lithography below 70 nm: tool performance and resist process

S. Hirscher, M. Kümmel, O. Kirch, W.-D. Domke, A. Wolter, R. Käsmaier, H. Buschbeck, E. Cekan, A. Chalupka, A. Chylik, S. Eder, C. Horner, H. Löschner, R. Nowak, G. Stengl, T. Windischbauer, M. Zeinin
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Volume:
61-62
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0167-9317(02)00529-4
File:
PDF, 859 KB
english, 2002
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