Mask characteristics for projection electron-beam...

Mask characteristics for projection electron-beam lithography with demagnification imaging

Peng Kaiwu, Zhang Fuan, Wu Guijun, Gu Wenqi, Sun Xia, Kang Niankan, Pu Qirong, Ding Zejun
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Volume:
61-62
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0167-9317(02)00533-6
File:
PDF, 193 KB
english, 2002
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