Characteristics of Ru as a buffer layer or an etch stopper for EUVL mask patterning
B.T. Lee, E. Hoshino, M. Takahashi, T. Yoneda, H. Yamanashi, H. Hoko, A. Chiba, M. Ito, T. Ogawa, S. OkazakiVolume:
61-62
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0167-9317(02)00534-8
File:
PDF, 479 KB
english, 2002