Development of a laser-produced plasma source at 13.5 nm...

Microelectronic Engineering 2002 Vol. 61-62; Iss. none

Development of a laser-produced plasma source at 13.5 nm for the French extreme ultraviolet lithography test bench

M. Segers, M. Bougeard, E. Caprin, T. Ceccotti, D. Normand, M. Schmidt, O. Sublemontier
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Volume:
61-62
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0167-9317(02)00578-6
File:
PDF, 247 KB
english, 2002
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