Reactive ion etching of metal stack consisting of an aluminium alloy, WGex, barrier and Ti adhesion layer
E. Sabouret, C. Schaffnit, J.F. Jongste, G.C.A.M. Janssen, S. RadelaarVolume:
37-38
Year:
1997
Language:
english
Pages:
11
DOI:
10.1016/s0167-9317(97)00133-0
File:
PDF, 528 KB
english, 1997