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The effect of an additional Ti layer in a sub-μm double level TiTiNAlSiCuTiN metallization for a CMS-LOGIC-process
K.-H. Stegemann, C. Beyer, V. Heinig, V. Kahlert, J. PahnerVolume:
37-38
Year:
1997
Language:
english
Pages:
10
DOI:
10.1016/s0167-9317(97)00140-8
File:
PDF, 599 KB
english, 1997