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New approach of Monte Carlo simulation for low energy electron beam lithography
Soo-Hwan Kim, Young-Mog Ham, Wongyu Lee, Kukjin ChunVolume:
41-42
Year:
1998
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(98)00040-9
File:
PDF, 262 KB
english, 1998