Volume 41-42; Issue none

Main
Microelectronic Engineering
Volume 41-42; Issue none

Microelectronic Engineering

Volume 41-42; Issue none

1

Preface

Michael Hatzakis, Evangelos Gogolides

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 134 KB

english, 1998

2

Author index volumes 41/42

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 873 KB

english, 1998

3

ULSI development, a historical perspective

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 72 KB

english, 1998

4

Next generation lithography and ASET's activities

Akihiko Ishitani

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 81 KB

english, 1998

5

Mask patterning challenges for device fabrication below 100 nm

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 592 KB

english, 1998

6

Single electronics with metallic and semiconducting nanostructures

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 73 KB

english, 1998

7

New trends in plasma etching for ultra large scale integration technology

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 600 KB

english, 1998

8

Status and future of X-ray lithography

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 464 KB

english, 1998

9

Nanoengineering beyond nanoelectronics

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 473 KB

english, 1998

10

Status and future of DUV photoresists for the semiconductor industry

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 278 KB

english, 1998

11

Microlithography in midlife crisis

Christopher P. Ausschnitt

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 473 KB

english, 1998

12

Microsystem technology: Between research and industrial application

M. Abraham, W. Ehrfeld, V. Hessel, K.P. Kämper, M. Lacher, A. Picard

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 354 KB

english, 1998

13

Photomask requirements needed to support future lithography

Photronics Inc., M. Yomazzo, D. Van Den Broeke

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 531 KB

english, 1998

14

0.12 μm optical lithography performances using an alternating DUV phase shift mask

Y. Trouiller, N. Buffet, T. Mourier, P. Schiavone, Y. Quere

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 277 KB

english, 1998

15

Optical proximity correction and its application to CD control in high-speed microprocessors

Anthony Yen, M. Burkhardt, J.R. Ilzhoefer, R.G. Fleck, H. Du, J. Randall

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 457 KB

english, 1998

16

The future of lithography after 193 nm optics

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 277 KB

english, 1998

17

Advanced ArF excimer laser for 193 nm lithography

R. Lindner, U. Stamm, R. Pätzel, D. Basting

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 245 KB

english, 1998

18

Optical proximity correction: A detail comparison of techniques and their effectiveness

H. Zhang, J. Morrow, F.M. Schellenberg

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 272 KB

english, 1998

19

Sub-resolution feature OPC as an enabler for manufacturing at 0.2μm and below

J. Randall, A. Tritchkov, K. Ronse, P. Jaenen

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 360 KB

english, 1998

20

Complete manufacturability of sub-wavelength lithography using optical enhancements

Martin McCallum, Kevin Lucas, Mike Kling, John Maltabes

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 315 KB

english, 1998

21

Illuminator design for the printing of regular contact patterns

Martin Burkhardt, Anthony Yen, Christopher Progler, Greg Wells

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 362 KB

english, 1998

22

Model based lithographic tool choices for a continuous state-of-the-art factory

J.G. Maltabes, T.L. Perkinson, L.C. Litt, R. Hershey, S. Murphy

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 379 KB

english, 1998

23

Automatic generation of phase-shifting mask patterns using shifter-edge lines

E. Tamechika, T. Watanabe, K. Komatsu

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 266 KB

english, 1998

24

Lithographic evaluation of a DUV carbon attenuated phase shift mask

A.C. Callegari, K. Babich, S. Purushothaman, S. Mansfield, R. Ferguson, A. Wong, W. Adair, D. O'Grady, V. Chao

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 252 KB

english, 1998

25

Feasibility of 250 nm gate patterning using i-line with OPC

V. Van Driessche, J. Finders, A. Tritchkov, K. Ronse, L. Van den hove, P. Tzviatkov

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 330 KB

english, 1998

26

The impact of aberration averaging during step-and-scan on the photolithographic process

A. Erdmann, M. Arnz

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 257 KB

english, 1998

27

Fabrication of phase masks with sub-half micron resolution by electron beam lithography

E. Di Fabrizio, L. Grella, M. Gentili, M. Baciocchi, L. Mastrogiacomo, F. Vaninetti, F. Fontana

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 315 KB

english, 1998

28

TiSixOy as an absorptive shifter for embedded phase-shifting mask in 248 nm and the modification of R-T method for the determination of shifter's n and k

Wen-an Loong, Chih-wei Chen, Ya-hui Chang, Cheng-ming Lin, Zheng Cui, Chien-an Lung

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 273 KB

english, 1998

29

Optical properties of thin/thick film stacks: Application to attenuated phase-shifting masks and photoresist characterization

P. Schiavone, G. Granet

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 259 KB

english, 1998

30

Process control of contact holes for sub-half-micron CMOS technology

B. Martin, G. Arthur, C. Brown

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 252 KB

english, 1998

31

Analysis of sub-wavelength sized OPC features

K. Adam, A.R. Neureuther, R. Socha, T. Pistor

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 303 KB

english, 1998

32

Compaction-limited system lifetime in 193-nm optical lithography

Richard Schenker, William Oldham

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 285 KB

english, 1998

33

Interferometric lithography — from periodic arrays to arbitrary patterns

S.R.J. Brueck, S.H. Zaidi, X. Chen, Z. Zhang

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 353 KB

english, 1998

34

Fine-pattern lithography for large substrates using a holographic mask-aligner

A.R. Nobari, S. Gray, F. Clube, D. Struchen, S. Malfoy, N. Magnon, B. Le Gratiet

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 277 KB

english, 1998

35

Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL)

J.A. Liddle, M.I. Blakey, C.S. Knurek, M.M. Mkrtchyan, A.E. Novembre, L. Ocola, T. Saunders, W.K. Waskiewicz

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 288 KB

english, 1998

36

Spot movement due to signal transients in multiple deflector blankers in electron beam lithography machines

E.H. Mulder, P. Kruit

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 264 KB

english, 1998

37

Tolerancing of electron beam lithography columns

H. Liu, X. Zhu, E. Munro, J.A. Rouse

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 312 KB

english, 1998

38

Fabrication of microelectron gun arrays using laser micromachining

Seong.S. Choi, M.Y. Jung, D.W. Kim, M.A. Yakshin, J.Y. Park, Y. Kuk

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 284 KB

english, 1998

39

Calculation of energy deposition in thin resist films over multilayer substrates

I. Raptis, N. Glezos, A. Rosenbusch, G. Patsis, P. Argitis

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 262 KB

english, 1998

40

Monte Carlo simulation of electron beam lithography on topographical substrates

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 299 KB

english, 1998

41

New approach of Monte Carlo simulation for low energy electron beam lithography

Soo-Hwan Kim, Young-Mog Ham, Wongyu Lee, Kukjin Chun

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 262 KB

english, 1998

42

Proximity correction of chemically amplified resists for electron beam lithography

Zheng Cui, Philp D Prewett

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 312 KB

english, 1998

43

Micro-technology of densely spaced non-conventional patterns for space applications

G. Stangl, P. Hudek, I. Kostic, F. Rüdenauer, I. Rangelow, K. Riedling, W. Fallmann

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 236 KB

english, 1998

44

Software for temperature simulation (TEMPTATION) in electron-beam lithography

S. Babin, I.Yu. Kuzmin, G. Sergeev

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 259 KB

english, 1998

45

Optimal filtering versus regularization methods in the Fourier precompensation based proximity neurocorrection in Electron Beam Lithography

P. Jedrasik, J. Garcia, B. De Boeck, D Van Dyck

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 306 KB

english, 1998

46

Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks

X. Liu, S. Thomas, J.S. Aitchison, R.M. De La Rue, J.A.R. Williams, L. Everall, I. Bennion

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 315 KB

english, 1998

47

Low voltage e-beam irradiation: a new tool for suppression of airborne contamination effects in positive chemically amplified resists

V.A. Kudryashov, P.D. Prewett, A.G. Michette

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 313 KB

english, 1998

48

Sub - 35 nm metal gratings fabricated using PMMA with high contrast developers

S. Thoms, D.S. Macintyre, M. McCarthy

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 264 KB

english, 1998

49

The fabrication of high resolution features by mould injection

D. Macintyre, S. Thoms

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 359 KB

english, 1998

50

Electron-optics method for high-throughput in a SCALPEL system: Preliminary analysis

W.K. Waskiewicz, L.R. Harriott, J.A. Liddle, S.T. Stanton, S.D. Berger, E. Munro, X. Zhu

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 273 KB

english, 1998

51

Sub-10 nm pattern placement verification of quantum tomography freestanding gratings

M.F.A. Eurlings, J.T.M. van Beek, M.J. Verheijen, J.P. Weterings, H.C.W. Beijerinck

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 289 KB

english, 1998

52

Stencil mask distortion control using nonsymmetric perforation rings

M. Sprague, W. Semke, R. Engelstad, E. Lovell, A. Chalupka, H. Löschner, G. Stengl

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 285 KB

english, 1998

53

A method to profile ion beam line exposures in situ using STM

P.D. Rose, S.J. Brown, G.A.C. Jones, D.A. Ritchie

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 282 KB

english, 1998

54

Investigation of dwell-time effects on the cobalt disilicide formation using focused ion beam implantation

S. Hausmann, L. Bischoff, J. Teichert, D. Grambole, F. Herrmann, W. Möller

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 312 KB

english, 1998

55

DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing

W.H. Bruenger, H. Buschbeck, E. Cekan, S. Eder, T.H. Fedynyshyn, W.G. Hertlein, P. Hudek, I. Kostic, H. Loeschner, I.W. Rangelow, M. Torkler

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 306 KB

english, 1998

56

Lifetime enhancement of a multicusp ion source for lithography

Y. Lee, R.A. Gough, W.B. Kunkel, K.N. Leung, J. Vujic, M.D. Williams, D. Wutte, F.L. Yang

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 324 KB

english, 1998

57

Mechanical modeling of ion beam lithography masks

A. Fisher, R. Tejeda, M. Sprague, R. Engelstad, E. Lovell

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 302 KB

english, 1998

58

Influence of Coulomb interactions on current density distribution in a two-lens focused ion beam system

J. Bi, P.W.H. de Jager, J.E. Barth, P. Kruit

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 268 KB

english, 1998

59

Focused ion beam written lateral field-effect transistors on standard silicon wafers

C. Crell, H.-U. Schreiber, A.D. Wieck

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 292 KB

english, 1998

60

An X-ray exposure system for 100-nm-order SR lithography

H. Tsuyuzaki, M. Fukuda, M. Suzuki, T. Kaneko, N. Takeuchi, M. Kanai

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 266 KB

english, 1998

61

The printing conditions for 0.13μm features in x-ray lithography using Pohang light Source

Yongduck Seo, Jawoong Lee, Bo Kyoung Choi, Heesang Kim, Ohyun Kim

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 264 KB

english, 1998

62

Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography

Scott Hector, Victor Pol, Mumit Khan, Srinivas Bollepalli, Franco Cerrina

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 348 KB

english, 1998

63

Very low contrast X-ray masks for high resolution printing

Y. Chen, G. Simon, A.M. Haghiri-Gosnet, L. Manin, H. Launois

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 351 KB

english, 1998

64

Novel route for the production of X-ray masks from a range of organometallic films

M.R. Davidson, G.J. Berry, J.A. Cairns, A.G. Fitzgerald, B. Lawrenson, J. Thomson, I.C.E. Turcu, W. Shaikh, N. Spencer, R.M. Allott, N. Takeyasu

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 330 KB

english, 1998

65

X-ray mask distortions during e-beam patterning

B. Shamoun, M. Sprague, F. Bedford, R. Engelstad, F. Cerrina

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 284 KB

english, 1998

66

Thermal characteristics of an X-ray mask during pattern transfer

D.J. Resnick, S.V. Pendharkar, W.J. Dauksher, K.D. Cummings, M.F. Laudon, B. Romanowicz, P. Renaud, R.L. Engelstad

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 312 KB

english, 1998

67

New gap detection method using two lasers optical heterodyne interference for X-ray lithography

M. Suzuki, M. Fukuda, H. Tsuyuzaki

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 347 KB

english, 1998

68

Absorber edge effect in proximity X-ray lithography

G. Simon, Y. Chen, A.M. Haghiri-Gosnet, D. Decanini, J. Bourneix, F. Rousseaux, H. Launois

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 333 KB

english, 1998

69

Characterization of acid diffusion for a negative chemically amplified resist using X-ray proximity lithography

Bo K. Choi, J.S. Yang, K.H. Lee, Ohuun Kim

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 260 KB

english, 1998

70

Evaluation of second generation DUV resists for advanced microprocessors

J.G. Maltabes, C. Yuan, C.C. Fu, J.S. Sturtevant, S. Blackley, L. Pressley

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 193 KB

english, 1998

71

Analysing the dissolution characteristics of deep uv chemically amplified photoresist

G. Arthur, C.A. Mack, N. Eilbeck, B. Martin

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 275 KB

english, 1998

72

Evaluation of DNQ/novolac resists for 130 nm device maskmaking

Zoilo C.H. Tan, Phuong Le, Homer Lem

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 350 KB

english, 1998

73

E-beam proximity correction for negative tone chemically amplified resists taking into account post-bake effects

N. Glezos, G.P. Patsis, A. Rosenbusch, Z. Cui

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 273 KB

english, 1998

74

Resolution of calixarene resist under low energy electron irradiation

J. Fujita, Y. Ohnishi, S. Manako, Y. Ochiai, E. Nomura, S. Matsui

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 258 KB

english, 1998

75

Electron-beam exposure characteristics of a novel Ru-PMMA composite resist

M.D.R. Thomas, D.G. Hasko, H. Ahmed, D.B. Brown, B.F.G. Johnson

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 309 KB

english, 1998

76

Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations

H. Namatsu, T. Yamaguchi, M. Nagase, K. Yamazaki, K. Kurihara

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 423 KB

english, 1998

77

Silylation of epoxy functionalised photoresists for optical, e-beam lithography and micromachining applications

E. Tegou, E. Gogolides, P. Argitis, A. Boudouvis, M. Hatzakis

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 353 KB

english, 1998

78

High performance positive DUV photoresists AZ® DX 1100P, AZ® DX 1200P. AZ® DX 1300P, AZ® DX 2034P, AZ® DX 2058P for advanced lithographic applications

W. Spiess, S. Funato, Y. Kinoshita, Y. Nozaki, G. Pawlowski

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 335 KB

english, 1998

79

Partially carboxymethylated novolaks for photoresist systems: New photoresists for development under mildly alkaline conditions

U. Westerwelle, G. Bähr, G. Grützner, F. Reuther

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 282 KB

english, 1998

80

Further developments for 193 nm top surface imaging resist

D.W. Johnson, M.I. Egbe, C. Chen, Y. Liao, S. Dionisio, C.E. Crowley

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 286 KB

english, 1998

81

Dependence of developed negative resist profiles on exposure energy dose: experiment, modeling, and simulation

P.I. Hagouel, I. Karafyllidis, A.R. Neureuther

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 265 KB

english, 1998

82

Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresists

P. Argitis, M.A. Vasilopoulou, E. Gogolides, E. Tegou, M. Hatzakis, Z. Kollia, A.C. Cefalas

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 252 KB

english, 1998

83

Systematic studies of functionalized calixarenes as negative tone electron beam

F.E. Prins, J. Pfeiffer, S. Raible, D.P. Kern, V. Schurig

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 218 KB

english, 1998

84

A study of dissolution characteristics and acid diffusion in chemically amplified DUV resist

T. Itani, S. Hashimoto, M. Yamana, N. Samoto, K. Kasama

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 244 KB

english, 1998

85

Extensive thermal characterization of advanced resists by Modulated Temperature DSC (MT-DSC): Application to acrylate based 193 nm resists

P.J. Paniez, J-A. Guinot, B. Mortini, C. Rosilio

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 287 KB

english, 1998

86

Mechanical characterization of a new high-aspect-ratio near UV-photoresist

H. Lorenz, M. Laudon, P. Renaud

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 369 KB

english, 1998

87

A post metal etch cleaning process for 0.25 μm technology

D. Louis, E. Lajoinie, W. Mun Lee, D. Holmes

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 372 KB

english, 1998

88

Electron cyclotron resonance reactive ion etching of GaAs in chlorine-methane

S. Penner, M. Fallahi, O. Nordman

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 265 KB

english, 1998

89

Classification of impact-assisted etch mechanisms

Falco C.M.J.M. van Delft, J.Ben Giesbers

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 293 KB

english, 1998

90

Complete plasma physics, plasma chemistry, and surface chemistry simulation of SiO2 and Si etching in CF4 plasmas

E. Gogolides, P. Vauvert, A. Rhallabi, G. Turban

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 301 KB

english, 1998

91

Modeling and simulation of profile aberrations resulting from dry etching of poly-silicon for critical gate levels

Karla Börnig, Bernd Jünemann, Peter Hoffmann

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 320 KB

english, 1998

92

Influence of O2-RIE on silicon substrate -Estimating plasma damage with bipolar transistor characteristics-

T. Nakanishi, N. Mitsuhira, M. Hisada, A. Nagami, M. Hashimoto, K. Hanafusa, N. Okumura

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 285 KB

english, 1998

93

Sub-100 nm lithography and high aspect-ratio masks for fabrication of Josephson devices by ion implantation

J. Hollkott, F. Kahlmann, C. Jaekel, S. Hu, B. Spangenberg, H. Kurz

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 298 KB

english, 1998

94

Submicrometer patterning of YBa2Cu3O7−x

H. Elsner, R. Ijsselsteijn, W. Morgenroth, H. Roth, H.-G. Meyer

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 280 KB

english, 1998

95

Highly anisotropic silicon and polysilicon room-temperature etching using fluorine-based high density plasmas

A. Tserepi, E. Gogolides, C. Cardinaud, L. Rolland, G. Turban

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 274 KB

english, 1998

96

Post etch cleaning of low-k dielectric materials for advanced interconnects: Characterization and process optimization

D. Louis, E. Lajoinie, F. Pires, W.M. Lee, D. Holmes

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 297 KB

english, 1998

97

Effects of annealing on electron cyclotron resonance plasma-induced damage in GaAs/Ga0.5In0.5P quantum well wires structures

I. Maximov, L. Landin, L. Samuelson

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 254 KB

english, 1998

98

A new approach to aspect ratio independent etching

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 242 KB

english, 1998

99

Influence of etching parameters on the defect profile and the depth of damage of AlGaAs induced by ion beam etching

K. Otte, F. Frost, A. Schindler, G. Lippold, V. Gottschalch, R.-H. Flagmeyer, F. Bigl

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 298 KB

english, 1998

100

Dependence of the quality of thick resist structures on resist baking

G. Bleidiessel, G. Gruetzner, F. Reuther, S. Fehlberg, B. Loechel, A. Maciossek

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 318 KB

english, 1998

101

Miniaturization of Si diaphragms obtained by wafer bonding

D. Goustouridis, P. Normand, D. Tsoukalas

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 275 KB

english, 1998

102

Piezoresistive sensors on AFM cantilevers with atomic resolution

R. Jumpertz, A.v.d. Hart, O. Ohlsson, F. Saurenbach, J. Schelten

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 300 KB

english, 1998

103

Fabrication of slot antenna coupled warm carrier detectors for millimeter wave radiation

Yoshizumi Yasuoka, Takashi Shimizu, Kenji Gamo

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 278 KB

english, 1998

104

Fabrication of integrated double-gated field emission microsource and its electrical characteristics

Y.J. Lee, S.H. Kang, K. Chun

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 256 KB

english, 1998

105

Fabrication of field emitter array using focused ion and electron beam induced reaction

M. Takai, T. Kishimoto, H. Morimoto, Y.K. Park, S. Lipp, C. Lehrer, L. Frey, H. Ryssel, A. Hosono, S. Kawabuchi

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 361 KB

english, 1998

106

Novel dual-gate HEMT utilising multiple split gates

N.J. Collier, J.R.A. Cleaver

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 362 KB

english, 1998

107

Free 3D shaping with grey-tone lithography and multidose e-beam writing

M. Kalus, M. Frey, L.-M. Buchmann, K. Reimer, B. Wagner

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 388 KB

english, 1998

108

Generation of large area condenser zone plates with smallest zone width below 40 nm by electron beam lithography

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 296 KB

english, 1998

109

Micro-Raman characterization of stress distribution within free standing mono- and poly-crystalline silicon membranes

M. Siakavellas, E. Anastassakis, G. Kaltsas, A.G. Nassiopoulos

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 297 KB

english, 1998

110

Polysilicon air-bridge thermal sensor coupled to log-periodic antenna for infrared detection

N. Chong, H. Ahmed

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 237 KB

english, 1998

111

Fabrication of multipurpose AFM/SCM/SEP microprobe with integrated piezoresistive deflection sensor and isolated conductive tip

T. Gotszalk, P. Grabiec, F. Shi, P. Dumania, P. Hudek, I.W. Rangelow

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 398 KB

english, 1998

112

Highly selective two-ion-carrier chemically modified FET's

N.A. Chaniotakis, E.A. Moschou, G. Constantinidis

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 233 KB

english, 1998

113

Construction of microcolumn system and its application to nanolithography

Y.J. Lee, S.H. Kang, D.H. Kim, J.Y. Park, H.J. Choi, Y. Kuk, K. Chun

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 231 KB

english, 1998

114

Fabrication and characterisation of an array of miniaturized electrostatic multipoles

H.S. Gross, F.E. Prins, D.P. Kern

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 331 KB

english, 1998

115

Multi-level exposures and 3-D X-ray patterning for high-aspect ratio microstructures

C. Khan-Malek, R. Wood, Z. Ling, B. Dudley, S. Stadler

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 340 KB

english, 1998

116

Ultrasharp diamond-coated silicon tips for scanning-probe devices

E.I. Givargizov, A.N. Stepanova, E.S. Mashkova, V.A. Molchanov, F Shi, P. Hudek, I.W. Rangelow

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 344 KB

english, 1998

117

Coulomb blockade nanothermometer

J.P. Kauppinen, J.P. Pekola

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 257 KB

english, 1998

118

Coulomb Blockade effect through a 2D ordered array of Pd islands obtained by colloidal deposition

C. Lebreton, C. Vieu, A. Pépin, M. Mejias, F. Carcenac, Y. Jin, H. Launois

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 303 KB

english, 1998

119

Silicon single-electron memory structure

N.J. Stone, H. Ahmed

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 243 KB

english, 1998

120

Monte Carlo simulation of the growth of metallic quantum dots

M. Boero, P.A. Mulheran, J.C. Inkson

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 294 KB

english, 1998

121

Nanofabrication by direct epitaxial growth

Gyula Eres, F.Y.C. Hui, T.G. Thundat, D.C. Joy

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 312 KB

english, 1998

122

Fabrication of Si nanodevices by optical lithography and anisotropic etching

D. Tsoukalas, P. Normand, C. Aidinis, E. Kapetanakis, P. Argitis

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 325 KB

english, 1998

123

Si nanostructures formed by pattern-dependent oxidation

M. Nagase, A. Fujiwara, K. Yamazaki, Y. Takahashi, K. Murase, K. Kurihara

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 276 KB

english, 1998

124

MOS-compatible fabrication and characterization of tunnel junctions in BESOI-material

T. Köster, B. Hadam, F. Goldschmidtböing, K. Hofmann, J. Gondermann, J. Stein, S. Hu, S. Altmeyer, B. Spangenberg, H. Kurz

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 289 KB

english, 1998

125

Monodisperse aerosol particle deposition: Prospects for nanoelectronics

W. Prost, F.E. Kruis, F. Otten, K. Nielsch, B. Rellinghaus, U. Auer, A. Peled, E.F. Wassermann, H. Fissan, F.J. Tegude

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 386 KB

english, 1998

126

Fabrication of size-controlled 10-nm scale Si pillars using metal clusters as formation nuclei

T. Tada, T. Kanayama, K. Koga, K. Seeger, S.J. Carroll, P. Weibel, R.E. Palmer

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 241 KB

english, 1998

127

Fabrication of metallic probes by a new technology based on double molding

C. Beuret, Ph. Niedermann, U. Staufer, N.F. de Rooij

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 445 KB

english, 1998

128

Electrolytic thin layer scanning tunneling microscope: fabrication and first results

P.-F. Indermühle, E. Ammann, P. Häring, R. Kötz, H. Siegenthaler, N.F. de Rooij

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 336 KB

english, 1998

129

Fabrication of Si nano-wires using anisotropic dry and wet etching

P. Normand, D. Tsoukalas, C. Aidinis, A. Tserepi, D. Kouvatsos, E. Kapetanakis

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 231 KB

english, 1998

130

A novel fabrication technique of T-shaped gates using an EGMEA and PMIPK multi-layer resist system and a single-step electron-beam exposure

Yeong-Lin Lai, Yeong-Kang Lai, Chun-Yen Chang, Edward Y. Chang

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 315 KB

english, 1998

131

A new technology for metallic multilayer single electron tunneling devices

Th. Weimann, H. Scherer, H. Wolf, V.A. Krupenin, J. Niemeyer

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 261 KB

english, 1998

132

Fabrication of Coulomb blockade devices by combination of high resolution electron beam lithography and deposition of granular films

M. Mejias, C. Lebreton, C. Vieu, A. Pépin, F. Carcenac, H. Launois, M. Boero

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 350 KB

english, 1998

133

Contact and alignment marker technology for atomic scale device fabrication

M.R. Zuiddam, S. Rogge, L.J. Geerligs, E. van der Drift, B. Ilge, G. Palasantzas

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 333 KB

english, 1998

134

Contacting single template synthesized nanowires for electric measurements

A. Bachtold, C. Terrier, M. Krüger, M. Henny, T. Hoss, C. Strunk, R. Huber, H. Birk, U. Staufer, C. Schönenberger

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 282 KB

english, 1998

135

Hot embossing in polymers as a direct way to pattern resist

R.W. Jaszewski, H. Schift, J. Gobrecht, P. Smith

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 355 KB

english, 1998

136

Mesoscale thermal infrared sources

S.O.C. Giraud, D.G. Hasko

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 261 KB

english, 1998

137

Potential use of the tendency of III—V alloys to separate for fabrication of low dimensionality structures

A. Georgakilas, K. Michelakis, G. Halkias, N. Bécourt, F. Peiro, A. Cornet

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 366 KB

english, 1998

138

Atomic lithography

A.S. Bell, T. Pfau, U. Drodofsky, J. Stuhler, Th. Schulze, B. Brezger, S. Nowak, J. Mlynek

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 285 KB

english, 1998

139

Effects of growth interruption in in situ process for buried quantum structures

F. Wakaya, T. Matsubara, M. Nakayama, J. Yanagisawa, Y. Yuba, S. Takaoka, K. Murase, K. Gamo, K. Gamo

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 253 KB

english, 1998

140

Scanning electron microscope matching and calibration for dimensional metrology

Herschel Marchman

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 604 KB

english, 1998

141

Edge detection and stability for a new e-beam pattern placement metrology instrument

W. Häßler-Grohne, H. Bosse

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 241 KB

english, 1998

142

A new technique for multiple overlay check

L. Auzino, A. Cangiano

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 209 KB

english, 1998

143

Micro-extraction spectrometer for voltage contrast in the SEM

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 302 KB

english, 1998

144

Calibration of transfer standards for SPM

Gao-Feng, Gwo-Sheng Peng, L. Koenders

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 211 KB

english, 1998

145

Optical characterisation of thin organic films by analysing transmission measurements with the Forouhi-Bloomer model

D. Davazoglou, M.A. Vasilopoulou, P. Argitis

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 289 KB

english, 1998

146

Measurement capabilities of optical 3D-sensors for MST applications

U. Brand, J. Flügge

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 243 KB

english, 1998

147

Electron microscopical and holographical investigation of quantum dots

G. Ade, R. Lauer

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 252 KB

english, 1998

148

Editorial Board

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 63 KB

english, 1998

149

High energy implantation by ion projection

J. Meijer, A. Stephan

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 296 KB

english, 1998