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Open LITERA Point
Volume 41-42; Issue none
Main
Microelectronic Engineering
Volume 41-42; Issue none
Microelectronic Engineering
Volume 41-42; Issue none
1
Preface
Michael Hatzakis
,
Evangelos Gogolides
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 134 KB
Your tags:
english, 1998
2
Author index volumes 41/42
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 873 KB
Your tags:
english, 1998
3
ULSI development, a historical perspective
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 72 KB
Your tags:
english, 1998
4
Next generation lithography and ASET's activities
Akihiko Ishitani
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 81 KB
Your tags:
english, 1998
5
Mask patterning challenges for device fabrication below 100 nm
Mark Gesley
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 592 KB
Your tags:
english, 1998
6
Single electronics with metallic and semiconducting nanostructures
H. Ahmed
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 73 KB
Your tags:
english, 1998
7
New trends in plasma etching for ultra large scale integration technology
O. Joubert
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 600 KB
Your tags:
english, 1998
8
Status and future of X-ray lithography
Scott Hector
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 464 KB
Your tags:
english, 1998
9
Nanoengineering beyond nanoelectronics
H. Rohrer
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 473 KB
Your tags:
english, 1998
10
Status and future of DUV photoresists for the semiconductor industry
J.W. Thackeray
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 278 KB
Your tags:
english, 1998
11
Microlithography in midlife crisis
Christopher P. Ausschnitt
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 473 KB
Your tags:
english, 1998
12
Microsystem technology: Between research and industrial application
M. Abraham
,
W. Ehrfeld
,
V. Hessel
,
K.P. Kämper
,
M. Lacher
,
A. Picard
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 354 KB
Your tags:
english, 1998
13
Photomask requirements needed to support future lithography
Photronics Inc.
,
M. Yomazzo
,
D. Van Den Broeke
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 531 KB
Your tags:
english, 1998
14
0.12 μm optical lithography performances using an alternating DUV phase shift mask
Y. Trouiller
,
N. Buffet
,
T. Mourier
,
P. Schiavone
,
Y. Quere
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 277 KB
Your tags:
english, 1998
15
Optical proximity correction and its application to CD control in high-speed microprocessors
Anthony Yen
,
M. Burkhardt
,
J.R. Ilzhoefer
,
R.G. Fleck
,
H. Du
,
J. Randall
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 457 KB
Your tags:
english, 1998
16
The future of lithography after 193 nm optics
R.S. Mackay
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 277 KB
Your tags:
english, 1998
17
Advanced ArF excimer laser for 193 nm lithography
R. Lindner
,
U. Stamm
,
R. Pätzel
,
D. Basting
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 245 KB
Your tags:
english, 1998
18
Optical proximity correction: A detail comparison of techniques and their effectiveness
H. Zhang
,
J. Morrow
,
F.M. Schellenberg
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 272 KB
Your tags:
english, 1998
19
Sub-resolution feature OPC as an enabler for manufacturing at 0.2μm and below
J. Randall
,
A. Tritchkov
,
K. Ronse
,
P. Jaenen
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 360 KB
Your tags:
english, 1998
20
Complete manufacturability of sub-wavelength lithography using optical enhancements
Martin McCallum
,
Kevin Lucas
,
Mike Kling
,
John Maltabes
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 315 KB
Your tags:
english, 1998
21
Illuminator design for the printing of regular contact patterns
Martin Burkhardt
,
Anthony Yen
,
Christopher Progler
,
Greg Wells
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 362 KB
Your tags:
english, 1998
22
Model based lithographic tool choices for a continuous state-of-the-art factory
J.G. Maltabes
,
T.L. Perkinson
,
L.C. Litt
,
R. Hershey
,
S. Murphy
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 379 KB
Your tags:
english, 1998
23
Automatic generation of phase-shifting mask patterns using shifter-edge lines
E. Tamechika
,
T. Watanabe
,
K. Komatsu
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 266 KB
Your tags:
english, 1998
24
Lithographic evaluation of a DUV carbon attenuated phase shift mask
A.C. Callegari
,
K. Babich
,
S. Purushothaman
,
S. Mansfield
,
R. Ferguson
,
A. Wong
,
W. Adair
,
D. O'Grady
,
V. Chao
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 252 KB
Your tags:
english, 1998
25
Feasibility of 250 nm gate patterning using i-line with OPC
V. Van Driessche
,
J. Finders
,
A. Tritchkov
,
K. Ronse
,
L. Van den hove
,
P. Tzviatkov
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 330 KB
Your tags:
english, 1998
26
The impact of aberration averaging during step-and-scan on the photolithographic process
A. Erdmann
,
M. Arnz
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 257 KB
Your tags:
english, 1998
27
Fabrication of phase masks with sub-half micron resolution by electron beam lithography
E. Di Fabrizio
,
L. Grella
,
M. Gentili
,
M. Baciocchi
,
L. Mastrogiacomo
,
F. Vaninetti
,
F. Fontana
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 315 KB
Your tags:
english, 1998
28
TiSixOy as an absorptive shifter for embedded phase-shifting mask in 248 nm and the modification of R-T method for the determination of shifter's n and k
Wen-an Loong
,
Chih-wei Chen
,
Ya-hui Chang
,
Cheng-ming Lin
,
Zheng Cui
,
Chien-an Lung
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 273 KB
Your tags:
english, 1998
29
Optical properties of thin/thick film stacks: Application to attenuated phase-shifting masks and photoresist characterization
P. Schiavone
,
G. Granet
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 259 KB
Your tags:
english, 1998
30
Process control of contact holes for sub-half-micron CMOS technology
B. Martin
,
G. Arthur
,
C. Brown
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 252 KB
Your tags:
english, 1998
31
Analysis of sub-wavelength sized OPC features
K. Adam
,
A.R. Neureuther
,
R. Socha
,
T. Pistor
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 303 KB
Your tags:
english, 1998
32
Compaction-limited system lifetime in 193-nm optical lithography
Richard Schenker
,
William Oldham
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 285 KB
Your tags:
english, 1998
33
Interferometric lithography — from periodic arrays to arbitrary patterns
S.R.J. Brueck
,
S.H. Zaidi
,
X. Chen
,
Z. Zhang
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 353 KB
Your tags:
english, 1998
34
Fine-pattern lithography for large substrates using a holographic mask-aligner
A.R. Nobari
,
S. Gray
,
F. Clube
,
D. Struchen
,
S. Malfoy
,
N. Magnon
,
B. Le Gratiet
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 277 KB
Your tags:
english, 1998
35
Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL)
J.A. Liddle
,
M.I. Blakey
,
C.S. Knurek
,
M.M. Mkrtchyan
,
A.E. Novembre
,
L. Ocola
,
T. Saunders
,
W.K. Waskiewicz
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 288 KB
Your tags:
english, 1998
36
Spot movement due to signal transients in multiple deflector blankers in electron beam lithography machines
E.H. Mulder
,
P. Kruit
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 264 KB
Your tags:
english, 1998
37
Tolerancing of electron beam lithography columns
H. Liu
,
X. Zhu
,
E. Munro
,
J.A. Rouse
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 312 KB
Your tags:
english, 1998
38
Fabrication of microelectron gun arrays using laser micromachining
Seong.S. Choi
,
M.Y. Jung
,
D.W. Kim
,
M.A. Yakshin
,
J.Y. Park
,
Y. Kuk
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 284 KB
Your tags:
english, 1998
39
Calculation of energy deposition in thin resist films over multilayer substrates
I. Raptis
,
N. Glezos
,
A. Rosenbusch
,
G. Patsis
,
P. Argitis
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 262 KB
Your tags:
english, 1998
40
Monte Carlo simulation of electron beam lithography on topographical substrates
Zheng Cui
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 299 KB
Your tags:
english, 1998
41
New approach of Monte Carlo simulation for low energy electron beam lithography
Soo-Hwan Kim
,
Young-Mog Ham
,
Wongyu Lee
,
Kukjin Chun
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 262 KB
Your tags:
english, 1998
42
Proximity correction of chemically amplified resists for electron beam lithography
Zheng Cui
,
Philp D Prewett
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 312 KB
Your tags:
english, 1998
43
Micro-technology of densely spaced non-conventional patterns for space applications
G. Stangl
,
P. Hudek
,
I. Kostic
,
F. Rüdenauer
,
I. Rangelow
,
K. Riedling
,
W. Fallmann
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 236 KB
Your tags:
english, 1998
44
Software for temperature simulation (TEMPTATION) in electron-beam lithography
S. Babin
,
I.Yu. Kuzmin
,
G. Sergeev
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 259 KB
Your tags:
english, 1998
45
Optimal filtering versus regularization methods in the Fourier precompensation based proximity neurocorrection in Electron Beam Lithography
P. Jedrasik
,
J. Garcia
,
B. De Boeck
,
D Van Dyck
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 306 KB
Your tags:
english, 1998
46
Surface roughness reduction and diffraction efficiency optimisation for e-beam written phase masks
X. Liu
,
S. Thomas
,
J.S. Aitchison
,
R.M. De La Rue
,
J.A.R. Williams
,
L. Everall
,
I. Bennion
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 315 KB
Your tags:
english, 1998
47
Low voltage e-beam irradiation: a new tool for suppression of airborne contamination effects in positive chemically amplified resists
V.A. Kudryashov
,
P.D. Prewett
,
A.G. Michette
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 313 KB
Your tags:
english, 1998
48
Sub - 35 nm metal gratings fabricated using PMMA with high contrast developers
S. Thoms
,
D.S. Macintyre
,
M. McCarthy
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 264 KB
Your tags:
english, 1998
49
The fabrication of high resolution features by mould injection
D. Macintyre
,
S. Thoms
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 359 KB
Your tags:
english, 1998
50
Electron-optics method for high-throughput in a SCALPEL system: Preliminary analysis
W.K. Waskiewicz
,
L.R. Harriott
,
J.A. Liddle
,
S.T. Stanton
,
S.D. Berger
,
E. Munro
,
X. Zhu
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 273 KB
Your tags:
english, 1998
51
Sub-10 nm pattern placement verification of quantum tomography freestanding gratings
M.F.A. Eurlings
,
J.T.M. van Beek
,
M.J. Verheijen
,
J.P. Weterings
,
H.C.W. Beijerinck
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 289 KB
Your tags:
english, 1998
52
Stencil mask distortion control using nonsymmetric perforation rings
M. Sprague
,
W. Semke
,
R. Engelstad
,
E. Lovell
,
A. Chalupka
,
H. Löschner
,
G. Stengl
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 285 KB
Your tags:
english, 1998
53
A method to profile ion beam line exposures in situ using STM
P.D. Rose
,
S.J. Brown
,
G.A.C. Jones
,
D.A. Ritchie
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 282 KB
Your tags:
english, 1998
54
Investigation of dwell-time effects on the cobalt disilicide formation using focused ion beam implantation
S. Hausmann
,
L. Bischoff
,
J. Teichert
,
D. Grambole
,
F. Herrmann
,
W. Möller
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 312 KB
Your tags:
english, 1998
55
DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing
W.H. Bruenger
,
H. Buschbeck
,
E. Cekan
,
S. Eder
,
T.H. Fedynyshyn
,
W.G. Hertlein
,
P. Hudek
,
I. Kostic
,
H. Loeschner
,
I.W. Rangelow
,
M. Torkler
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 306 KB
Your tags:
english, 1998
56
Lifetime enhancement of a multicusp ion source for lithography
Y. Lee
,
R.A. Gough
,
W.B. Kunkel
,
K.N. Leung
,
J. Vujic
,
M.D. Williams
,
D. Wutte
,
F.L. Yang
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 324 KB
Your tags:
english, 1998
57
Mechanical modeling of ion beam lithography masks
A. Fisher
,
R. Tejeda
,
M. Sprague
,
R. Engelstad
,
E. Lovell
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 302 KB
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english, 1998
58
Influence of Coulomb interactions on current density distribution in a two-lens focused ion beam system
J. Bi
,
P.W.H. de Jager
,
J.E. Barth
,
P. Kruit
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 268 KB
Your tags:
english, 1998
59
Focused ion beam written lateral field-effect transistors on standard silicon wafers
C. Crell
,
H.-U. Schreiber
,
A.D. Wieck
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 292 KB
Your tags:
english, 1998
60
An X-ray exposure system for 100-nm-order SR lithography
H. Tsuyuzaki
,
M. Fukuda
,
M. Suzuki
,
T. Kaneko
,
N. Takeuchi
,
M. Kanai
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 266 KB
Your tags:
english, 1998
61
The printing conditions for 0.13μm features in x-ray lithography using Pohang light Source
Yongduck Seo
,
Jawoong Lee
,
Bo Kyoung Choi
,
Heesang Kim
,
Ohyun Kim
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 264 KB
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english, 1998
62
Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography
Scott Hector
,
Victor Pol
,
Mumit Khan
,
Srinivas Bollepalli
,
Franco Cerrina
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 348 KB
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english, 1998
63
Very low contrast X-ray masks for high resolution printing
Y. Chen
,
G. Simon
,
A.M. Haghiri-Gosnet
,
L. Manin
,
H. Launois
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 351 KB
Your tags:
english, 1998
64
Novel route for the production of X-ray masks from a range of organometallic films
M.R. Davidson
,
G.J. Berry
,
J.A. Cairns
,
A.G. Fitzgerald
,
B. Lawrenson
,
J. Thomson
,
I.C.E. Turcu
,
W. Shaikh
,
N. Spencer
,
R.M. Allott
,
N. Takeyasu
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 330 KB
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english, 1998
65
X-ray mask distortions during e-beam patterning
B. Shamoun
,
M. Sprague
,
F. Bedford
,
R. Engelstad
,
F. Cerrina
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 284 KB
Your tags:
english, 1998
66
Thermal characteristics of an X-ray mask during pattern transfer
D.J. Resnick
,
S.V. Pendharkar
,
W.J. Dauksher
,
K.D. Cummings
,
M.F. Laudon
,
B. Romanowicz
,
P. Renaud
,
R.L. Engelstad
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 312 KB
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english, 1998
67
New gap detection method using two lasers optical heterodyne interference for X-ray lithography
M. Suzuki
,
M. Fukuda
,
H. Tsuyuzaki
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 347 KB
Your tags:
english, 1998
68
Absorber edge effect in proximity X-ray lithography
G. Simon
,
Y. Chen
,
A.M. Haghiri-Gosnet
,
D. Decanini
,
J. Bourneix
,
F. Rousseaux
,
H. Launois
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 333 KB
Your tags:
english, 1998
69
Characterization of acid diffusion for a negative chemically amplified resist using X-ray proximity lithography
Bo K. Choi
,
J.S. Yang
,
K.H. Lee
,
Ohuun Kim
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 260 KB
Your tags:
english, 1998
70
Evaluation of second generation DUV resists for advanced microprocessors
J.G. Maltabes
,
C. Yuan
,
C.C. Fu
,
J.S. Sturtevant
,
S. Blackley
,
L. Pressley
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 193 KB
Your tags:
english, 1998
71
Analysing the dissolution characteristics of deep uv chemically amplified photoresist
G. Arthur
,
C.A. Mack
,
N. Eilbeck
,
B. Martin
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 275 KB
Your tags:
english, 1998
72
Evaluation of DNQ/novolac resists for 130 nm device maskmaking
Zoilo C.H. Tan
,
Phuong Le
,
Homer Lem
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 350 KB
Your tags:
english, 1998
73
E-beam proximity correction for negative tone chemically amplified resists taking into account post-bake effects
N. Glezos
,
G.P. Patsis
,
A. Rosenbusch
,
Z. Cui
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 273 KB
Your tags:
english, 1998
74
Resolution of calixarene resist under low energy electron irradiation
J. Fujita
,
Y. Ohnishi
,
S. Manako
,
Y. Ochiai
,
E. Nomura
,
S. Matsui
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 258 KB
Your tags:
english, 1998
75
Electron-beam exposure characteristics of a novel Ru-PMMA composite resist
M.D.R. Thomas
,
D.G. Hasko
,
H. Ahmed
,
D.B. Brown
,
B.F.G. Johnson
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 309 KB
Your tags:
english, 1998
76
Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth fluctuations
H. Namatsu
,
T. Yamaguchi
,
M. Nagase
,
K. Yamazaki
,
K. Kurihara
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 423 KB
Your tags:
english, 1998
77
Silylation of epoxy functionalised photoresists for optical, e-beam lithography and micromachining applications
E. Tegou
,
E. Gogolides
,
P. Argitis
,
A. Boudouvis
,
M. Hatzakis
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 353 KB
Your tags:
english, 1998
78
High performance positive DUV photoresists AZ® DX 1100P, AZ® DX 1200P. AZ® DX 1300P, AZ® DX 2034P, AZ® DX 2058P for advanced lithographic applications
W. Spiess
,
S. Funato
,
Y. Kinoshita
,
Y. Nozaki
,
G. Pawlowski
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 335 KB
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79
Partially carboxymethylated novolaks for photoresist systems: New photoresists for development under mildly alkaline conditions
U. Westerwelle
,
G. Bähr
,
G. Grützner
,
F. Reuther
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
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80
Further developments for 193 nm top surface imaging resist
D.W. Johnson
,
M.I. Egbe
,
C. Chen
,
Y. Liao
,
S. Dionisio
,
C.E. Crowley
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 286 KB
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english, 1998
81
Dependence of developed negative resist profiles on exposure energy dose: experiment, modeling, and simulation
P.I. Hagouel
,
I. Karafyllidis
,
A.R. Neureuther
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 265 KB
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english, 1998
82
Etch resistance enhancement and absorbance optimization with polyaromatic compounds for the design of 193 nm photoresists
P. Argitis
,
M.A. Vasilopoulou
,
E. Gogolides
,
E. Tegou
,
M. Hatzakis
,
Z. Kollia
,
A.C. Cefalas
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
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83
Systematic studies of functionalized calixarenes as negative tone electron beam
F.E. Prins
,
J. Pfeiffer
,
S. Raible
,
D.P. Kern
,
V. Schurig
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 218 KB
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84
A study of dissolution characteristics and acid diffusion in chemically amplified DUV resist
T. Itani
,
S. Hashimoto
,
M. Yamana
,
N. Samoto
,
K. Kasama
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 244 KB
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85
Extensive thermal characterization of advanced resists by Modulated Temperature DSC (MT-DSC): Application to acrylate based 193 nm resists
P.J. Paniez
,
J-A. Guinot
,
B. Mortini
,
C. Rosilio
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 287 KB
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english, 1998
86
Mechanical characterization of a new high-aspect-ratio near UV-photoresist
H. Lorenz
,
M. Laudon
,
P. Renaud
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 369 KB
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87
A post metal etch cleaning process for 0.25 μm technology
D. Louis
,
E. Lajoinie
,
W. Mun Lee
,
D. Holmes
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 372 KB
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english, 1998
88
Electron cyclotron resonance reactive ion etching of GaAs in chlorine-methane
S. Penner
,
M. Fallahi
,
O. Nordman
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 265 KB
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english, 1998
89
Classification of impact-assisted etch mechanisms
Falco C.M.J.M. van Delft
,
J.Ben Giesbers
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
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english, 1998
90
Complete plasma physics, plasma chemistry, and surface chemistry simulation of SiO2 and Si etching in CF4 plasmas
E. Gogolides
,
P. Vauvert
,
A. Rhallabi
,
G. Turban
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 301 KB
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english, 1998
91
Modeling and simulation of profile aberrations resulting from dry etching of poly-silicon for critical gate levels
Karla Börnig
,
Bernd Jünemann
,
Peter Hoffmann
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 320 KB
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english, 1998
92
Influence of O2-RIE on silicon substrate -Estimating plasma damage with bipolar transistor characteristics-
T. Nakanishi
,
N. Mitsuhira
,
M. Hisada
,
A. Nagami
,
M. Hashimoto
,
K. Hanafusa
,
N. Okumura
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 285 KB
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93
Sub-100 nm lithography and high aspect-ratio masks for fabrication of Josephson devices by ion implantation
J. Hollkott
,
F. Kahlmann
,
C. Jaekel
,
S. Hu
,
B. Spangenberg
,
H. Kurz
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 298 KB
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94
Submicrometer patterning of YBa2Cu3O7−x
H. Elsner
,
R. Ijsselsteijn
,
W. Morgenroth
,
H. Roth
,
H.-G. Meyer
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 280 KB
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95
Highly anisotropic silicon and polysilicon room-temperature etching using fluorine-based high density plasmas
A. Tserepi
,
E. Gogolides
,
C. Cardinaud
,
L. Rolland
,
G. Turban
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 274 KB
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english, 1998
96
Post etch cleaning of low-k dielectric materials for advanced interconnects: Characterization and process optimization
D. Louis
,
E. Lajoinie
,
F. Pires
,
W.M. Lee
,
D. Holmes
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 297 KB
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english, 1998
97
Effects of annealing on electron cyclotron resonance plasma-induced damage in GaAs/Ga0.5In0.5P quantum well wires structures
I. Maximov
,
L. Landin
,
L. Samuelson
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 254 KB
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english, 1998
98
A new approach to aspect ratio independent etching
V.F. Lukichev
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 242 KB
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99
Influence of etching parameters on the defect profile and the depth of damage of AlGaAs induced by ion beam etching
K. Otte
,
F. Frost
,
A. Schindler
,
G. Lippold
,
V. Gottschalch
,
R.-H. Flagmeyer
,
F. Bigl
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 298 KB
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english, 1998
100
Dependence of the quality of thick resist structures on resist baking
G. Bleidiessel
,
G. Gruetzner
,
F. Reuther
,
S. Fehlberg
,
B. Loechel
,
A. Maciossek
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 318 KB
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english, 1998
101
Miniaturization of Si diaphragms obtained by wafer bonding
D. Goustouridis
,
P. Normand
,
D. Tsoukalas
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 275 KB
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english, 1998
102
Piezoresistive sensors on AFM cantilevers with atomic resolution
R. Jumpertz
,
A.v.d. Hart
,
O. Ohlsson
,
F. Saurenbach
,
J. Schelten
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 300 KB
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english, 1998
103
Fabrication of slot antenna coupled warm carrier detectors for millimeter wave radiation
Yoshizumi Yasuoka
,
Takashi Shimizu
,
Kenji Gamo
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 278 KB
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english, 1998
104
Fabrication of integrated double-gated field emission microsource and its electrical characteristics
Y.J. Lee
,
S.H. Kang
,
K. Chun
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 256 KB
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english, 1998
105
Fabrication of field emitter array using focused ion and electron beam induced reaction
M. Takai
,
T. Kishimoto
,
H. Morimoto
,
Y.K. Park
,
S. Lipp
,
C. Lehrer
,
L. Frey
,
H. Ryssel
,
A. Hosono
,
S. Kawabuchi
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 361 KB
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english, 1998
106
Novel dual-gate HEMT utilising multiple split gates
N.J. Collier
,
J.R.A. Cleaver
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 362 KB
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107
Free 3D shaping with grey-tone lithography and multidose e-beam writing
M. Kalus
,
M. Frey
,
L.-M. Buchmann
,
K. Reimer
,
B. Wagner
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 388 KB
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english, 1998
108
Generation of large area condenser zone plates with smallest zone width below 40 nm by electron beam lithography
T. Schliebe
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 296 KB
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109
Micro-Raman characterization of stress distribution within free standing mono- and poly-crystalline silicon membranes
M. Siakavellas
,
E. Anastassakis
,
G. Kaltsas
,
A.G. Nassiopoulos
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 297 KB
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110
Polysilicon air-bridge thermal sensor coupled to log-periodic antenna for infrared detection
N. Chong
,
H. Ahmed
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 237 KB
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english, 1998
111
Fabrication of multipurpose AFM/SCM/SEP microprobe with integrated piezoresistive deflection sensor and isolated conductive tip
T. Gotszalk
,
P. Grabiec
,
F. Shi
,
P. Dumania
,
P. Hudek
,
I.W. Rangelow
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 398 KB
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english, 1998
112
Highly selective two-ion-carrier chemically modified FET's
N.A. Chaniotakis
,
E.A. Moschou
,
G. Constantinidis
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 233 KB
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english, 1998
113
Construction of microcolumn system and its application to nanolithography
Y.J. Lee
,
S.H. Kang
,
D.H. Kim
,
J.Y. Park
,
H.J. Choi
,
Y. Kuk
,
K. Chun
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 231 KB
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english, 1998
114
Fabrication and characterisation of an array of miniaturized electrostatic multipoles
H.S. Gross
,
F.E. Prins
,
D.P. Kern
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 331 KB
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english, 1998
115
Multi-level exposures and 3-D X-ray patterning for high-aspect ratio microstructures
C. Khan-Malek
,
R. Wood
,
Z. Ling
,
B. Dudley
,
S. Stadler
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 340 KB
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english, 1998
116
Ultrasharp diamond-coated silicon tips for scanning-probe devices
E.I. Givargizov
,
A.N. Stepanova
,
E.S. Mashkova
,
V.A. Molchanov
,
F Shi
,
P. Hudek
,
I.W. Rangelow
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 344 KB
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english, 1998
117
Coulomb blockade nanothermometer
J.P. Kauppinen
,
J.P. Pekola
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 257 KB
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english, 1998
118
Coulomb Blockade effect through a 2D ordered array of Pd islands obtained by colloidal deposition
C. Lebreton
,
C. Vieu
,
A. Pépin
,
M. Mejias
,
F. Carcenac
,
Y. Jin
,
H. Launois
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 303 KB
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english, 1998
119
Silicon single-electron memory structure
N.J. Stone
,
H. Ahmed
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 243 KB
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english, 1998
120
Monte Carlo simulation of the growth of metallic quantum dots
M. Boero
,
P.A. Mulheran
,
J.C. Inkson
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 294 KB
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english, 1998
121
Nanofabrication by direct epitaxial growth
Gyula Eres
,
F.Y.C. Hui
,
T.G. Thundat
,
D.C. Joy
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 312 KB
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english, 1998
122
Fabrication of Si nanodevices by optical lithography and anisotropic etching
D. Tsoukalas
,
P. Normand
,
C. Aidinis
,
E. Kapetanakis
,
P. Argitis
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 325 KB
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english, 1998
123
Si nanostructures formed by pattern-dependent oxidation
M. Nagase
,
A. Fujiwara
,
K. Yamazaki
,
Y. Takahashi
,
K. Murase
,
K. Kurihara
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 276 KB
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english, 1998
124
MOS-compatible fabrication and characterization of tunnel junctions in BESOI-material
T. Köster
,
B. Hadam
,
F. Goldschmidtböing
,
K. Hofmann
,
J. Gondermann
,
J. Stein
,
S. Hu
,
S. Altmeyer
,
B. Spangenberg
,
H. Kurz
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 289 KB
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125
Monodisperse aerosol particle deposition: Prospects for nanoelectronics
W. Prost
,
F.E. Kruis
,
F. Otten
,
K. Nielsch
,
B. Rellinghaus
,
U. Auer
,
A. Peled
,
E.F. Wassermann
,
H. Fissan
,
F.J. Tegude
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 386 KB
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english, 1998
126
Fabrication of size-controlled 10-nm scale Si pillars using metal clusters as formation nuclei
T. Tada
,
T. Kanayama
,
K. Koga
,
K. Seeger
,
S.J. Carroll
,
P. Weibel
,
R.E. Palmer
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 241 KB
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127
Fabrication of metallic probes by a new technology based on double molding
C. Beuret
,
Ph. Niedermann
,
U. Staufer
,
N.F. de Rooij
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 445 KB
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128
Electrolytic thin layer scanning tunneling microscope: fabrication and first results
P.-F. Indermühle
,
E. Ammann
,
P. Häring
,
R. Kötz
,
H. Siegenthaler
,
N.F. de Rooij
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 336 KB
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129
Fabrication of Si nano-wires using anisotropic dry and wet etching
P. Normand
,
D. Tsoukalas
,
C. Aidinis
,
A. Tserepi
,
D. Kouvatsos
,
E. Kapetanakis
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 231 KB
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130
A novel fabrication technique of T-shaped gates using an EGMEA and PMIPK multi-layer resist system and a single-step electron-beam exposure
Yeong-Lin Lai
,
Yeong-Kang Lai
,
Chun-Yen Chang
,
Edward Y. Chang
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 315 KB
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131
A new technology for metallic multilayer single electron tunneling devices
Th. Weimann
,
H. Scherer
,
H. Wolf
,
V.A. Krupenin
,
J. Niemeyer
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 261 KB
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132
Fabrication of Coulomb blockade devices by combination of high resolution electron beam lithography and deposition of granular films
M. Mejias
,
C. Lebreton
,
C. Vieu
,
A. Pépin
,
F. Carcenac
,
H. Launois
,
M. Boero
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 350 KB
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133
Contact and alignment marker technology for atomic scale device fabrication
M.R. Zuiddam
,
S. Rogge
,
L.J. Geerligs
,
E. van der Drift
,
B. Ilge
,
G. Palasantzas
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 333 KB
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134
Contacting single template synthesized nanowires for electric measurements
A. Bachtold
,
C. Terrier
,
M. Krüger
,
M. Henny
,
T. Hoss
,
C. Strunk
,
R. Huber
,
H. Birk
,
U. Staufer
,
C. Schönenberger
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 282 KB
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135
Hot embossing in polymers as a direct way to pattern resist
R.W. Jaszewski
,
H. Schift
,
J. Gobrecht
,
P. Smith
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 355 KB
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136
Mesoscale thermal infrared sources
S.O.C. Giraud
,
D.G. Hasko
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 261 KB
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137
Potential use of the tendency of III—V alloys to separate for fabrication of low dimensionality structures
A. Georgakilas
,
K. Michelakis
,
G. Halkias
,
N. Bécourt
,
F. Peiro
,
A. Cornet
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 366 KB
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138
Atomic lithography
A.S. Bell
,
T. Pfau
,
U. Drodofsky
,
J. Stuhler
,
Th. Schulze
,
B. Brezger
,
S. Nowak
,
J. Mlynek
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 285 KB
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139
Effects of growth interruption in in situ process for buried quantum structures
F. Wakaya
,
T. Matsubara
,
M. Nakayama
,
J. Yanagisawa
,
Y. Yuba
,
S. Takaoka
,
K. Murase
,
K. Gamo
,
K. Gamo
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 253 KB
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140
Scanning electron microscope matching and calibration for dimensional metrology
Herschel Marchman
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 604 KB
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141
Edge detection and stability for a new e-beam pattern placement metrology instrument
W. Häßler-Grohne
,
H. Bosse
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 241 KB
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142
A new technique for multiple overlay check
L. Auzino
,
A. Cangiano
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 209 KB
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143
Micro-extraction spectrometer for voltage contrast in the SEM
A.R. Dinnis
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 302 KB
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english, 1998
144
Calibration of transfer standards for SPM
Gao-Feng
,
Gwo-Sheng Peng
,
L. Koenders
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 211 KB
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english, 1998
145
Optical characterisation of thin organic films by analysing transmission measurements with the Forouhi-Bloomer model
D. Davazoglou
,
M.A. Vasilopoulou
,
P. Argitis
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 289 KB
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english, 1998
146
Measurement capabilities of optical 3D-sensors for MST applications
U. Brand
,
J. Flügge
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 243 KB
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147
Electron microscopical and holographical investigation of quantum dots
G. Ade
,
R. Lauer
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 252 KB
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english, 1998
148
Editorial Board
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 63 KB
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english, 1998
149
High energy implantation by ion projection
J. Meijer
,
A. Stephan
Journal:
Microelectronic Engineering
Year:
1998
Language:
english
File:
PDF, 296 KB
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english, 1998
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