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DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing
W.H. Bruenger, H. Buschbeck, E. Cekan, S. Eder, T.H. Fedynyshyn, W.G. Hertlein, P. Hudek, I. Kostic, H. Loeschner, I.W. Rangelow, M. TorklerVolume:
41-42
Year:
1998
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(98)00054-9
File:
PDF, 306 KB
english, 1998