E-beam proximity correction for negative tone chemically amplified resists taking into account post-bake effects
N. Glezos, G.P. Patsis, A. Rosenbusch, Z. CuiVolume:
41-42
Year:
1998
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(98)00073-2
File:
PDF, 273 KB
english, 1998